Polishing apparatus and method for planarizing layer on a semiconductor wafer

ABSTRACT

To planarize an insulating film formed on a semiconductor substrate, a polishing slurry containing cerium oxide is used to polish the surface of the insulating film. Using the cerium oxide included slurry as a polishing agent, the insulating film is not contaminated by alkali metals during the polishing process. Furthermore, the insulating film is polished at an enhanced polishing rate.

This application is a continuation of application Ser. No. 08/402,879filed Mar. 13, 1995, now abandoned; which was a continuation ofapplication Ser. No. 08/066,375 filed May 25, 1993, now U.S. Pat. No.5,445,996, issued Aug. 29, 1995.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a polishing apparatus and a method forplanarizing a layer on a semiconductor wafer.

2. Description of the Related Art

Conventionally, colloidal silica is popularly used as a polishing slurryfor polishing and planarizing the surface of insulating films or thelike in the process of manufacturing semiconductor devices.

There are used colloidal silica granules of a diameter as large as tensof several nanometers. The granules are normally obtained by growingsodium silicate in water. Obtained granulous silica is then mixed withwater to form a suspension or colloidal silica, to which KOH or NaOH isadded to regulate the hydrogen ion concentration of the suspension andat the same time achieve an enhanced polishing efficiency for theslurry.

Compol-80 marketed by Fujimi Corporation is one of commerciallyavailable polishing slurries of the above described type containing analkali metal. When a silicon oxide film is polished or scraped by usingthe slurry, the alkali metal contained in the slurry is at least partlydispersed into the silicon oxide film or the semiconductor device. Whenthe device is a MOS device, the dispersed metal fluctuates the thresholdvoltage level of the device to significantly reduce the reliability ofthe semiconductor device.

In order to avoid this problem, some preventive measures need to betaken such as additionally forming a protective film layer under thesilicon oxide film to block dispersion of alkali metal, making theoverall process of manufacturing semiconductor devices rather cumbersomeand complicated.

Now, how a prior art semiconductor device is produced will be brieflydescribed by referring to illustrations showing its sectional views invarious stages of preparation. FIG. 1A of the accompanying drawingsillustrates a conventional semiconductor device comprising asemiconductor substrate 1 and electrode or wire patterns designated byreference numeral 2. To protect the patterns, a protective film 3 isfirstly formed on the entire surface area of the semiconductorstructure, and subsequently a resist 4 is applied onto the film 3 andthen the resist 4 is subjected to a patterning operation by using alithographic technique, as illustrated in FIG. 1B. Thereafter, theprotective film 3 is selectively removed as the resist 4 is used asmasks. Thereafter, the resist 4 is removed to produce a patternedprotective film as shown in FIG. 1C. Thereafter, as illustrated in FIG.1D, a silicon oxide film 5 is formed on the semiconductor structure, andthen its surface is planarized using a polishing method to produce aplanar surface, as shown in FIG. 1E. However, the above conventionalmethod additionally requires the steps of FIGS. 1A through 1C, thuscomplicating the entire manufacturing process.

There is also used another polishing slurry of the colloidal silicaseries containing no alkali metal. The slurry is obtained by performingpyrolysis of silicic acid tetrachloride or hydrolysis of organic silaneto grow silica particles, and regulating the hydrogen ion concentrationof the produced silica by means of ammonia or an amine. This type ofpolishing slurry is, however, accompanied by a problem of anunpractically low polishing speed if used for silicon oxide films.

On the other hand, a well known method of polishing the surface of glassphoto-masks comprises steps of primary polishing using a suspension ofaluminum oxide and finish polishing using another suspension containingcerium oxide particles having an average particle size of severalmicrometers. However, such a two-step polishing operation involved inthe process of manufacturing semiconductor devices is not recommendableby any means, considering the fact that an insulating film needs to bepolished to reduce its thickness by only several micrometers.Furthermore, in the process of manufacturing semiconductor devices, aninsulating film layer is often formed on the surface of a semiconductorsubstrate that carries raised portions (conductive layers) having aheight of several hundreds to thousands nanometers. Such differences inheight of the surface of a semiconductor device will be clearlyreflected onto the profile of the insulating film formed thereon. Thestep configuration of the surface of the insulating film need to beplanarized by polishing. However, it has not at all been known for sureif cerium oxide particles having an average size of several micrometerscan successfully polish and planarize the surface that has aconfiguration of different heights of several hundreds to thousandsnanometers and if the insulating film will be contaminated by the alkalimetal as in the case where colloidal silica is used. All in all, theabove described method of polishing the surface of a glass layeroperating as a photo-mask has been developed without taking intoconsideration if it can be applied to the operation of polishingsemiconductor devices during the manufacturing process.

The above conventional methods of polishing semiconductor devices, usingcolloidal silica or the like as a polishing slurry, are accompanied bythe problem of contamination by alkali metal and that of a slowpolishing rate.

While a method of using a suspension that does not contain cerium oxideparticles is also known in the technology of polishing the surface ofglass photo-masks, it is not certain at all if such a method can polishand planarize a surface having a profile of steps of several hundreds tothousands nanometers high and if it is not accompanied by a problem ofmetal contamination. Again, it is a method that has been developedwithout taking into consideration if it can be applied to the operationof polishing semiconductor devices during the manufacturing process.

Now, a typical known polishing and planarizing technique of the categoryunder consideration will be described by referring to FIGS. 2A through2C of the accompanying drawings. As illustrated in FIG. 2A, asemiconductor device is prepared by forming an SiO₂ film 12 on an Sisemiconductor device 1 and then a metal wires 13 having a thickness of1.1 μm are appropriately formed on the SiO₂ film 12 to produce a givenpattern of metal wires.

Thereafter, another SiO₂ film 14 is formed on the entire surface of theabove intermediate product. Consequently, the surface of the second SiO₂layer shows raised portions and recessed portions, reflecting thepattern of metal wires. Then, the surface of the second SiO₂ layer 14 ispolished to remove the raised and recessed portions. The operation ofpolishing or scraping the surface of the second SiO₂ layer 14 will becarried out by using a polishing apparatus as illustrated in FIG. 3.

More specifically, an Si substrate 1 having a configuration as describedabove is set in position on the turntable the apparatus under a holder501. A polishing slurry feed pipe 503 is disposed above the turntable502 to feed a polishing slurry onto the truntable during the operationof polishing the substrate. A polishing cloth 504 is disposed betweenthe surface to be polished of the Si substrate 1 and the turntable 502so that the raised and recessed portions on the surface of thesemiconductor substrate are removed by particles of the polishing slurryand the polishing cloth 504 to provide a planarized surface of thesemiconductor substrate.

The holder 501 is subjected to a load of 40 kfg and rotated at a rate of100 rpm. The turntable is rotated at the same rotation speed.

While the above described polishing method using a polishing apparatuscan significantly reduce the raised portions on the surface of thesecond SiO₂ film 14, it also dishes the portions of the second SiO₂ film14 that are located between adjacent metal wires 13. This is aphenomenon normally referred to as "dishing".

FIG. 4 is a graph showing the result of an analysis of the "dishing"phenomenon observed in a case where each of the metal wires 13 is 500 μmwide and separated from any adjacent wires by 1,000 μm. In the graph ofFIG. 4, the abscissa represents the polishing time expressed in seconds,and the coordinate represents the distance between the surface of thefirst SiO₂ film 12 and the that of the second SiO₂ film 14.

Before starting the polishing operation, the distance (solid line inFIG. 4) between the areas (raised portions) of the surface of the SiO₂film 12 carrying a metal wire 13 and the surface of the SiO₂ film 14 andthe distance (broken line in FIG. 4) between the areas (recessedportions) of the surface of the SiO₂ 12 film carrying no metal wire andthe surface of the SiO₂ film 14 show a difference of 1.1 μm which isequal to the height of the metal wires 43.

As the polishing operation proceeds, the difference between the distanceseparating the surface of the SiO₂ film 12 and that of the SiO₂ film 14at the raised portions and the corresponding distance at the recessedportions is reduced because the speed at which the SiO₂ film 14 ispolished off for the raised portions is greater than the speed at whichit is polished off for the recessed portions. The reason for thedifference in speed is that the SiO₂ film 14 is subjected to a greaterload at the raised portions.

However, the rate at which the difference between the distanceseparating the surface of the SiO₂ film 12 and that of the SiO₂ film 14at the raised portion and the corresponding distance at the recessedportions is reduced is actually very low. If the polishing operation isconducted for 70 seconds and the SiO₂ film 14 is polished off byapproximately 1.0 μm at the raised portions, the thickness of the SiO₂film 14 will be reduced by approximately 0.65 μm by polishing so thatconsequently there will remain a difference of approximately 0.35 μmbetween the distance separating the surface of the SiO₂ film 12 and thatof the SiO₂ film 14 at the raised portions and the correspondingdistance at the recessed portions.

The surface of the SiO₂ film 14 can be almost completely andsatisfactorily planarized by forming a rather thick SiO₂ film andpolishing the film to a large extent.

Such a method of forming a thick film and polishing off the film is,however, very time consuming and hence increases the manufacturing cost.Moreover, the more the film is polished, the greater becomes thefluctuations in the polishing speed on the film, a phenomenon by nomeans favorable for the polishing operation.

The above described dishing phenomenon for the recessed portions can beprevented by forming, for instance, a silicon nitride film as a "polishstopper" for the recessed portions in order to suppress the rate ofpolishing the SiO₂ film 14 at the recessed portions and increase therate at which the difference in the thickness of the SiO₂ film 14 at theraised and recessed portions is reduced.

This technique is schematically illustrated in FIGS. 5A through 5D,which show a semiconductor structure in cross section. Referring firstlyto FIG. 5A, an SiO₂ film 12 is formed on an Si substrate and (1.1 μmthick) metal wires 13 are formed thereon in a manner as describedbefore.

Thereafter, another SiO₂ film 14 is formed on the entire surface of theintermediate product as shown in FIG. 5B.

Then, a silicon nitride film 15 is formed on the SiO₂ film 14 andsubsequently is subjected to a patterning operation, in which, as shownin FIG. 5C, the silicon nitride film 15 is removed except at therecessed portions where no metal wires are formed under the SiO₂ film14.

Finally, the surface of the SiO₂ film 14 is polished by using apolishing apparatus as illustrated in FIG. 3 in a manner same as the onedescribed above.

With this technique, the hight difference significantly disappears fromthe surface of the SiO₂ film 14 as shown in FIG. 5D, and the dishing ofthe SiO₂ film 14 is also reduced. However, the SiO₂ film 14 shows slightupward bulges in areas of the metal wires 13 to provide small increasedand recessed portions that are reversals of those of the SiO₂ film 14before the SiO₂ film 14 is polished.

The result of an analysis looking into this phenomenon is summarized inFIG. 6. The object of the analysis is a device comprising metal wires 13have a width of 500 μm and arranged with a distance of 1,000 μmseparating adjacent wires. The abscissa of the graph of FIG. 6represents the polishing time (seconds) in the processing step of FIG.5D, while the coordinate represents the distance between the surface ofthe first SiO₂ film 12 and the that of the second SiO₂ film 14.

Before the start of the operation of polishing the device, the distance(solid line in FIG. 6) between the areas (raised portions) of thesurface of the SiO₂ film 12 carrying a metal wire 13 and the surface ofthe SiO₂ film 14 and the distance (broken line in FIG. 6) between theareas (recessed portions) of the surface of the SiO₂ 12 film carrying nometal wire and the surface of the SiO₂ film 14 show a difference of 1.1μm which is equal to the height of the metal wires 13.

As the polishing operation proceeds, the difference between the distanceseparating the surface of the SiO₂ film 12 and that of the SiO₂ film 14at the raised portions and the corresponding distance at the recessedportions is reduced because the speed at which the SiO₂ film 14 ispolished off for the raised portions is greater than the speed at whichit is polished off for the recessed portions. The reason for thedifference in speed is that the SiO₂ film 14 is subjected to a greaterload at the raised portions. Additionally with this technique, the speedat which the SiO₂ film 14 is polished is very low at the recessedportions when compared with the speed at which it is polished at theraised portions because of the silicon nitride films 15 formed on therecessed portions and consequently the difference between the distanceseparating the surface of the SiO₂ film 12 and that of the SiO₂ film 14at the raised portions and the corresponding distance at the recessedportions is further reduced because the higher speed at which the SiO₂film 14 is polished off for the raised portions.

Approximately 70 seconds after the start of the polishing operation, thedifference between the distance separating the surface of the SiO₂ film12 and that of the SiO₂ film 14 at the raised portions and thecorresponding distance at the recessed portions is reduced to almost nilto make the surface of the SiO₂ film 14 flat. However, since thepolishing operation is continued after the surface of the SiO₂ film 14has become flat, the areas of the surface of the SiO₂ film 14 notcovered by a silicon nitride film 15, or the original raised portions,are further polished to make the film even thinner.

Thus, the difference between the distance separating the surface of theSiO₂ film 12 and that of the SiO₂ film 14 at the raised portions becomessmaller than the corresponding distance at the recessed portions toprovide small raised and recessed portions that are reversals of thoseof the SiO₂ film 14 before the SiO₂ film 14 is polished.

Such reversals of raised and recessed portions on the surface of theSiO₂ film 14 can be prevented from occurring by optimizing the thicknessof the silicon nitride film 15 in such a manner that it may disappearwhen the surface of the SiO₂ film 14 is made completely flat. However,such a method of optimization of the silicon nitride film thickness willnot be feasible for industrial applications, because of the narrow rangeof the optimum thickness. Furthermore, the formation of a stopper film,a silicon nitride film in particular, and the operation of patterningthe film which are indispensable for the technique under considerationare rather complicated and involve a high additional cost.

Therefore, the known technique of using an insulating film as an aid tothe operation of polishing and planarizing the surface of asemiconductor device is also accompanied by the phenomenon of "dishing"that appears on the recessed portions to make the operation quiteunsatisfactory.

There has been proposed a technique to suppress the occurrence of"dishing" by selectively forming a stopper film, a silicon nitride filmin particular, only on the recessed portions.

With this technique, however, "dishing" appears on the raised portionsthat carry no stopper film immediately after the insulating film isplanarized so that again it is practically impossible to achieve asatisfactorily planar surface for the semiconductor device.

FIGS. 7A and 7B of the accompanying drawings illustrate the process ofpolishing and planarizing the surface of a semiconductor device by usingstill another known technique.

FIG. 7A shows a conventional semiconductor device comprising asemiconductor substrate 1 and a finely designed patterns 32 of variouselements including multilayered wires, semiconductor polycrystallinelayers, capacitors and electrodes realized in the form of a combinationof fine projections selectively formed on the substrate 1. The patterns32 are separated from one another by spaces, or recessed areas 33, 34,of which each of the recesses 33 represents a space separating twoadjacent elements that are located close to each other whereas each ofthe recesses 34 separates two adjacent elements with a large distance.The semiconductor device further comprises an insulating film 35 formedto cover the pattern 32 and a resist layer 36 formed on the insulatingfilm 35 by applying a resist material. Thus, the resist layer 36 has avarying thickness which is greater on the relatively wide recesses 34than on the narrower recesses 33. Subsequently, this resist 36 is etchedback to expose the insulating film 35 by, for instance, reactive ionetching (RIE) as illustrated in FIG. 7B, where 36a denotes those areasof the insulating film 35 located on the recesses 33 whereas 36b denotesthe areas found on the recesses 34. As seen from FIG. 7B, the surface ofthe insulating film 35 is undulated because, as the etch back operationproceeds on the resist 36, the insulating film 35 comes to be quicklyexposed and etched at locations above the recesses 33 where the resist36 is relatively thin.

FIGS. 8A and 8B of the accompanying drawings illustrate the process ofpolishing and planarizing the surface of a semiconductor device by usingstill another known technique. This process is normally carried outbefore a multilayer structure is produced in the device.

Referring to FIG. 8A, the semiconductor device comprises a semiconductorsubstrate 1 and a polysilicon high melting point metal silicide layer 42selectively formed as capacitors or electrodes on the semiconductorsubstrate 1 to provide a number of elements of the layer. Spaces definedby adjacent elements of the polysilicon high melting point metalsilicide layer 42 provides so many recesses, of which those having arelatively small width are denoted by reference numeral 43, whereasreference numeral 44 denotes those recesses having a relatively layerwidth. The semiconductor device further comprises an insulating film 45formed to cover the entire surface of the device, said insulating film45 being typically made of boron phosphorous silicon glass (BPSG). Whenthe BPSG film is caused to reflow by using a phosphor dispersion melttechnique as illustrated in FIG. 8B, the BPSG film 45 comes to show aremarkably undulated surface which is higher at locations above thewider recesses 42 separating elements of the polysilicon high meltingpoint metal silicide layer 42 than at locations above the narrowerrecessed 43 that also separates elements of the layer 42.

As may be understood from the above description, known techniques forpolishing and planarizing the surface of a semiconductor device are, inmost cases, required to deal with surface layers having a number ofprojections formed typically by electrodes, capacitors and wires andalso with surface layers having a number of recesses produced normallyby trenches and contact holes. The surface of a semiconductor devicehaving such an uneven surface layer is then planarized by forming aninsulating film thereon and etching the film back or causing the film toreflow.

However, the operation of etch back or reflow cannot satisfactorilyplanarize the surface of an insulating film because the recesses on thesurface of a semiconductor device of the type under consideration havewidely different widths. That is, the undulated surface of such aninsulating film cannot be completely planarized.

Obviously, the undulations remaining on the insulation film of asemiconductor device can have disadvantages on the following steps inthe manufacturing process.

Assume, for example, that a wiring material is laid on the surface of asemiconductor device having remaining undulations thereon and thensubjected to a patterning operation. Then, rays of light emitted on thelayer of the material for the patterning operation may not be accuratelyfocused on the layer and the produced wiring may exhibit a disturbedpattern. In view of the recent trend of producing highly integrateddevices requiring a precision level of submicrons and having arelatively large difference in the height between central and peripheralareas and a very narrowed space between any adjacent wires of the chip,such undulations on the surface can adversely affect not only the makeof the patterned wiring but also the electric characteristics of thedevice.

Additionally, while the technique of RIE is popularly used for theetching back operation, it can give rise to a loading effect which isspecific to anisotropic etching and attributable to the difference inthe size of the openings and the pattern to space ratio of the device sothat the rate and shape of etching may be adversely affected by thateffect to degrade the controllability of the technique.

Thus, there have been observed problems of broken wires and sortcircuits on semiconductor devices of the type under consideration thatcan significantly reduce the yield of manufacturing devices and reducesthe reliability of produced devices.

FIGS. 9A through 9C of the accompanying drawings illustrate in crosssection a known semiconductor device in three different steps ofpolishing and planarizing the insulating film.

Referring firstly to FIG. 9A, an SiO₂ film 52 is formed in an Sisemiconductor substrate 1 and thereafter a lower wiring layer 53 isformed on the SiO₂ film 52.

Then, as shown in FIG. 9B, another SiO₂ film 54 is formed by depositionto cover the entire surface of the semiconductor substrate 1 includingthe areas occupied by the lower wiring layer 53. Thereafter, the SiO₂film 54 is partly removed by polishing as shown in FIG. 9C.

The polishing operation is carried out to remove the undulations on thesurface of the SiO₂ film 54 as shown in FIG. 9B and make the surfaceflat.

However, as FIG. 9C suggests, while it is relatively easy to partlyflatten the surface of the SiO₂ film 54, the entire surface of the film54 cannot be made completely planar without difficulty because theextent to which the SiO₂ film 54 is polished off varies depending on theposition on the Si substrate 1. It is also not an easy task to controlthe extent of polishing the film 54.

A conceivable method of controlling the extent of polishing the SiO₂film 54 is to form an additional layer of silicon nitride film and usethe layer as a stopper. FIGS. 10A through 10D of the accompanyingdrawings illustrate how this method is put to actual use.

Referring firstly to FIG. 10A, an SiO₂ film 62 is formed in an Sisemiconductor substrate 1 and thereafter a lower wiring layer 63 isformed on the SiO₂ film 62.

Then, as shown in FIG. 10B, a silicon nitride film 64 is formed as astopper layer on the lower wiring layer 63 by deposition andsubsequently another SiO₂ film 65 is formed on the silicon nitride film64 also by deposition as shown in FIG. 10C. Thereafter, the SiO₂ film 65is partly removed by polishing as shown in FIG. 10D.

However, as FIG. 10D suggests, the effect of the polishing operationvaries depending on the position on the surface of the Si substrate 51.While there are areas where the silicon nitride film 64 operateeffectively as a stopper layer against the polishing operation, it istotally removed and the lower wiring layer 63 is polished to a certainextent in some other areas on the Si substrate 1.

FIGS. 11A through 11C and FIGS. 12A through 12E of the accompanyingdrawings respectively illustrates two different known processes forpreparing a thin film semiconductor device, where a silicon substrate isthinned by polishing.

Referring firstly to FIG. 11A, an SiO₂ film 72 is formed in an Sisubstrate 71.

Then, as shown in FIG. 11B, another Si substrate 73 is applied to the Sisubstrate 71 with the SiO₂ film 72 interposed therebetween andsubsequently the Si substrate 73 is thinned by polishing as illustratedin FIG. 1C.

Consequently, as FIG. 11C clearly shows, the thickness of the siliconthin film 73 varies greatly depending on the position of the Sisubstrate and is totally removed in some areas.

A conceivable method of controlling the extent of polishing the siliconthin film 73 is to form an additional layer of SiO₂ film, for instance,and use the layer as a stopper. FIGS. 12A through 12E of theaccompanying drawings illustrate how this method is put to actual use.

Referring firstly to FIG. 12A, an SiO₂ film 82 is formed in an Sisubstrate 81.

Then, as shown in FIG. 12B, another Si substrate 83 is applied to the Sisubstrate 81 with the SiO₂ film 82 interposed therebetween.Subsequently, openings are formed in the Si substrate 83 until theopenings reach the surface of the SiO₂ film 82 as illustrated in FIG.12C. Thereafter, as shown in FIG. 12D, another SiO₂ film 84 isselectively formed in those openings to a desired thickness bydeposition and then the Si substrate 83 is partly removed by polishing.

Here again, the effect of the polishing operation varies depending onthe position on the Si substrate. While the polishing operation proceedsas far as somewhere in the middle of the SiO₂ film 84 in some areas onthe Si substrate, it is totally removed and along with the silicon thinfilm 83 in other areas.

Any known methods of manufacturing semiconductor devices involving stepsof polishing the devices are accompanied by the above identifiedproblems, which can be summarized as follows.

One of the most significant problems is that, with any known methods,the extent of polishing the device can hardly be controlled. Here,control of the extent of polishing the device means absolute control ofthe polishing rate and that of the evenness of the device surface. Anytechnology of manufacturing semiconductor devices will not and cannot befeasible for practical applications unless it is capable of controllingthese two aspects. One known technique of controlling the extent ofpolishing is, as already described, to use a silicon nitride or SiO₂film as a stopper layer.

However, the use of a silicon nitride or SiO₂ film as a stopper layer isnot practical because they do not offer a sufficiently wide range ofselectable ratios of the rate of polishing the proper object to that ofpolishing the stopper. Moreover, the range of selectable ratios of therate of polishing the proper object to that of polishing the stoppervaries greatly depending on the polishing slurry used in the polishingoperation. For instance, the rate of polishing a SiO₂ film will be veryhigh if polishing slurry used for the polishing operation containssodium hydroxide to a relatively large concentration. In other words,the material to be used for the stopper layer should be selected byconsidering the type of polishing slurry involved.

Thus, any conventional process of polishing semiconductor devices isaccompanied by the problem of difficulty of controlling the extent ofpolishing the device and hence hardly feasible for practicalapplications.

It is also a common practice in any conventional process of polishingsemiconductor devices that a test piece (specimen) of the product ispolished to collect data for determining an optimum rate of polishingthe device and then devices are polished at that determined optimumrate. However, the rate of polishing the device varies as a function ofthe time consumed for the polishing operation as typically illustratedin FIG. 13 and, therefore, the optimum polishing rate determined on thetest piece does not necessarily reflect the actual polishing rateobserved on the manufacturing line.

The manner in which the polishing rate changes with time is then greatlyaffected by the amount of polishing slurry held in the polishing clothand the condition under which the polishing slurry is held in thepolishing cloth. This influence of the amount of polishing slurry andthe condition for the polishing of holding the slurry is so diverse thatit is practically beyond control.

In an attempt to bring the rate of polishing the test piece closer tothe actual rate of polishing devices on the manufacturing line, morethan one and preferably a considerably large number of test pieces areused to determine an optimum polishing rate. Such a measure, however,entails an increase in the manufacturing cost due to a higher materialcost for test pieces and a reduction in the operating hours of themanufacturing facilities, making it even more impractical.

Another proposed technique for accurately controlling the extent ofpolishing the device comprises preliminarily polishing the device to arelatively small extent, measuring the extent to which the device hasbeen actually polished and then repeating the above procedures until thedevice is polished to a desired extent. While this method does notinvolve any increase in the material cost for the test piece, it is timeconsuming and significantly reduce the operating hours of themanufacturing facilities. Furthermore, in view of the fact that asemiconductor device is polished by merely 1 μm in the manufacturingprocess, this method is by no means recommendable.

Thus, it should be stressed again that any known process ofmanufacturing semiconductor devices involving steps of polishing thedevices is accompanied by the problem of difficulty of controlling theextent of polishing the device.

While there have been proposed techniques to overcome this problemincluding the one that uses test pieces to determine the rate ofpolishing the device and the one with which the device is polished in aplurality of steps and the extent to which the device has been polishedis determined at each step, any of these techniques are notrecommendable because they can not satisfactorily control the extent ofpolishing and involve an increase in the manufacturing cost.

There is also known a method of polishing and planarizing semiconductordevices as disclosed in U.S. Pat. No. 5,036,015 "Method of EndpointDetection during Chemical/Mechanical Planarization of SemiconductorWafers". According to this method, the turntable of a planarizingapparatus is driven to rotate by an electric motor and changes in thefriction between the wafer held by a wafer holding device on theturntable and the polishing cloth for polishing the wafer are detectedas changes in the electric current flowing through the electric motor.

For planarizing a silicon oxide film, a layer made of a material harderthan the silicon oxide film is arranged under the silicon oxide film inadvance and the planarizing operation is terminated when the polishingplane of the polishing cloth reaches the hard layer to increase thefriction of the plane after completely removing the silicon oxide filmby polishing.

This known technique is also not without problems as described below byreferring to FIGS. 14 through 16.

FIG. 14 schematically illustrates a polishing apparatus of the abovedescribed type, which detects changes in the friction between the wafer1 and the polishing cloth 504 held on the turntable 502 for polishingthe wafer as changes in the electric currents respectively flowingthrough the electric motors 511 and 512 and displayed on thecorresponding ampere-meters 513 and 514.

Referring now to FIG. 15, each of the electric currents flowing throughthe respective electric motors 511 or 512 varies as a quadratic functionof the voltage of the corresponding power supply 515 or 516 and thereading for the current is affected by changes in the voltage. As seenfrom FIG. 16, however, since no load current Io flows through each ofthe electric motors when no load is applied thereto, it is difficult toaccurately detect the level of friction taking place on the turntable.

Referring back to FIG. 14, the shafts 517 and 518 of the turntable andholding device of the polishing apparatus are connected to therespective shafts of the corresponding motors 511 and 512 by respectivebelts 519 and 520 in order to eliminate any adverse effects of pulsationof the motors to which the polishing plane of the polishing cloth may besubjected to. However, the belts 519 and 520 can slip around therespective shafts 511 and 512 while they are driven to run to change theloads of the motors 511 and 512 SO that the ampere-meters 513 and 514may not correctly reflect the level of friction taking place on the turntable.

Meanwhile, according to another known method of polishing andplanarizing a semiconductor device, the rate of polishing the device isdetermined from the number of rotations of the turntable per unit periodof time and the load applied the polishing apparatus by the object ofpolishing in order to establish an optimum polishing time on the basisof the determined polishing rate and the required extent of polishing.

In a polishing apparatus designed to practice this method, a polishingcloth is arranged on a turntable which is driven to rotate by a drivemotor and a holding device for holding an object of polishing isdisposed on the polishing cloth. The holding device is also driven torotate by another drive motor.

Then, a semiconductor wafer to be polished by this apparatus is put onthe holder opposite to the turntable. The wafer comprises a wiring layerarranged on a silicon substrate with a first insulating film disposedtherebetween and a second insulating film disposed on the firstinsulating film. The holder device and the turntable are driven torotate for predetermined respective rotations per unit period of time bythe respective drive motors and the polishing cloth which is rotatingwith the turntable is fed with a polishing slurry. Then, the holderdevice is moved down until the wafer comes to contact with the polishingcloth. Under this condition, a predetermined load is applied to thewafer and the holder device is moved horizontally along the surface ofthe turntable to polish the wafer for a predetermined period of time toplanarize the surface of the second insulating film of the wafer thatcarries undulations thereon.

After the operation of planarizing the wafer is over, it is replaced bya new one and the above described procedures are repeated for eachuntreated wafer. When the polishing apparatus has been used for apredetermined service time, the polishing cloth is redressed to recoverits original condition by using a brush. After experiencing a number ofcycles of polishing and redressing, the polishing cloth is replaced by anew one.

According to the above described known polishing method, the rate ofpolishing the wafer is calculated from given polishing conditions or therotations per unit period of time of the wafer holder device, that ofthe turntable and the load applied to the wafer and an optimum polishingtime is selected from the polishing rate and the required extent ofpolishing. In other words, the polishing rate is assumed to be constantunless either or both of the polishing rate and the load are altered. Inreality, however, the polishing rate changes as the level of frictionbetween the wafer and the polishing cloth varies as a function of thetime consumed for polishing the wafer even if the rotations per unittime and the load are not altered.

FIG. 17 of the accompanying drawings illustrate the relationship betweenthe total service time of the polishing cloth and the polishing rate.The first 50 minutes in the total service time of the polishing clothare defined as an initial stage, which moves into a working stage whenthe first 50 minutes have passed.

FIG. 17 shows that the polishing rate varies also with time in theworking stage. This may be attributable to the changes in the surfacecondition of the polishing cloth that take place as the cloth is chokedby particles of the polishing slurry and the cloth is worn out and byturn reduce the efficiency of feeding particles of the polishing slurryto and discharging them from the surface of the polishing cloth andhence the efficiency of polishing the wafer. More specifically, thesurface of the polishing cloth 504 has a huge number of tissuessuspended therefrom and pores separating them as illustrated in FIG. 18and particles of the polishing are retained in those pores. Then, as thepolishing cloth is pressed against the wafer, the particles of thepolishing slurry retained in the pores are discharged onto the wafer.The efficiency of this polishing slurry feeding and dischargingmechanism is reduced with time as the polishing cloth is worn out tovary the polishing rate with time. As the surface condition of thepolishing cloth is further aggravated, it can give rise to scars on thepolished surface of the wafer and degrade the planar condition of thepolished surface.

A polishing cloth choked with particles of the polishing slurry can beredressed by means of a brush at an appropriate time. While theoperation of redressing is an effective way of deterring the wear of thepolishing cloth, the cloth requires replacement if its surface conditionis not recovered by redressing as such a situation suggests that theservice life of the cloth is over.

With the above described known polishing method, the timing orredressing the polishing cloth is selected on the basis of theexperience of the operator and that of replacing the polishing cloth isdetermined on the basis of the polishing rate calculated from themeasured value of the extent of polishing the wafer per unit period oftime. This means that in most cases the polishing cloth is not timelyredressed nor replaced and consequently the rate of polishing the waferis not kept to a constant level nor accurately controlled.

SUMMARY OF THE INVENTION

In view of the above circumstances, it is therefore an object of thepresent invention to provide a process of polishing semiconductordevices that keeps the device free from contamination by alkali metals,does not produce scars on the surface of the insulating film of thedevice, can effectively planarize the surface of the device havingundulations that are several hundreds to thousand nanometers high andcan be easily and appropriately incorporated into a process ofmanufacturing semiconductor devices.

According to the present invention, the above object is achieved byproviding a method of manufacturing semiconductor devices comprisingsteps of forming an insulating film on a semiconductor substrate andpolishing at least partly the insulating film by using a polishingslurry containing cerium oxide to partly remove the insulating film.According to the present invention, there is also provided a method ofmanufacturing semiconductor devices comprising steps of forming aninsulating film on the surface of a semiconductor substrate carryingprojections and recesses and polishing and planarizing the insulatingfilm by using a polishing slurry containing cerium oxide.

With either of the above methods according to the invention, theinsulating film can be polished at an enhanced rate as the insulatingfilm which is a silicon oxide film or a silicon nitride film is polishedby using a polishing slurry containing cerium oxide.

It has been proved that the inside of the insulating film is notcontaminated by alkali metals when it is polished. Additionally, it hasalso been proved that an insulating film carrying undulations that areseveral hundreds to thousands high on the surface can be polished and atthe same time planarized without producing scars on the surface of thefilm.

A polishing slurry that can be used in the step of polishing andplanarizing the semiconductor device according to the present inventionmay contain elements other than the principal ingredients, orimpurities, to a concentration of less than 100 ppm. Preferably, theprincipal ingredients are SiO₂ and H₂ or CeO₂ and H₂ and the impuritiesare selected from Na, K, other alkali metals and compounds of thesemetals.

By using a highly pure polishing slurry containing impurities only to avery low concentration, semiconductor devices can remain uncontaminatedby the impurities contained in the polishing slurry if the slurry isbrought to contact the wafer during the polishing operation and remainon the surface of the wafer.

It is another object of the present invention to provide a process ofmanufacturing semiconductor devices comprising steps capable ofcompletely planarizing the surface layer of the device.

According to the invention, the above object is achieved by providing amethod of manufacturing semiconductor devices comprising steps offorming a stopper film on the entire surface of a film to be polished,the surface of the film to be polished having undulations, the stopperfilm having a polishing rate lower than a polishing of rate said film tobe polished, and polishing the surface of the substrate carrying thestopper film formed thereon to planarize the film to be polished.

According to a series of research activities conducted by the inventorsof the present invention, the phenomenon of "dishing" can be avoidedwhen a stopper film having a polishing rate lower than a polishing ofrate the film to be polished is formed on the entire area of theundulated surface of the film to be polished and the stopper film andthe film to be polished are subjected to polishing, and consequently theundulations of the film to be polished can be effectively removed toplanarize the surface of the film. A possible explanation for the effectof providing a stopper film for planarization will be as follows.

Since projecting areas on an undulated surface are normally subjected toa load greater than the load applied to recessed areas of the surface,the former will be polished at a rate greater than the rate at which thelatter are polished.

Therefore, in the initial stages of the polishing operation, the stopperfilm will be polished mainly at areas that are located on theprojections. However, the undulations of the film to be polished are notreduced during these stages.

As the stopper film is further polished and eventually removed at theareas on the projections, the film which is the object of polishingbegins to be polished at the projections to reduce the undulations ofits surface.

Now, as the undulations of the film to be polished is further reduced,the stopper film will be polished at areas on the recesses until it iscompletely removed at a certain point of time. The film to he polishedis considered to be completely planarized in this instance. Thereafter,the film will be polished further, keeping its planar surface withoutallowing "dishing" to appear.

The research carried out by the inventors of the present invention hasalso proved that the advantage of the above described polishingtechnique does not depend on and is remarkable regardless of thethickness of the stopper film.

It is still another object of the present invention to provide a processof planarizing the surface of semiconductor devices at a high yieldregardless of the size of the undulations on the surface so that highlyreliable semiconductor devices may be produced.

According to the invention, the above object is achieved by providing amethod of polishing semiconductor devices comprising steps of forming aconductive film on a semiconductor substrates, producing recesses in theconductive film by selectively and partly removing the conductive film,forming an insulating film on the conductive film to a height at leastgreater than the depth of the recesses and polishing the insulating filmwith a polishing slurry containing cerium oxide, using the conductivefilm as a stopper, to planarize the surface of the conductive film andthe insulating film.

According to the invention, there is also provided a method of polishingsemiconductor devices comprising steps of forming a wiring pattern on asemiconductor substrate, forming an insulating film on the semiconductorsubstrate and the wiring pattern, forming a conductive film on theinsulating film, producing recesses in the insulating film and theconductive film to expose the wiring pattern by selectively removing thefilms, laying a wiring material on the conductive film having recessesto a height at least greater than the depth of the recesses andpolishing the wiring material with a polishing slurry containing ceriumoxide, using the conductive film as a stopper, to planarize the surfaceof the insulating film and the wiring material.

According to the invention, there is also provided a method of polishingsemiconductor devices comprising steps of forming first insulating filmon a semiconductor substrate, forming a wiring pattern on the firstinsulating film, forming an amorphous silicon film to make a secondinsulating film on the wiring pattern and the first insulating film,forming a third insulating film on the amorphous silicon film to aheight at least greater than that of the wiring pattern, polishing andremoving the third insulating film with a polishing slurry containingcerium oxide to planarize the surface of the third insulating film andthe amorphous silicon film and transforming the amorphous silicon filminto a second insulating film.

The conductive film to be used as a stopper is preferably made of amaterial selected from polysilicon, amorphous silicon, titanium nitride,a silicide film or carbon.

Since the above described methods do not use a technique of etch back orreflow for planarization, the recesses and projections of thesemiconductor device can be planarized regardless of their height.

Additionally, the use of a polishing slurry containing cerium oxideallows the polishing operation to be satisfactorily conducted under anneutral condition. So, no dissolution will occur if the lower wiringlayer contains highly materials that can easily be corroded.

Still additionally, since no RIE is used for etch back, there willappear no loading effect on the etching rate and pattern due to thedifference in the size and pattern of the openings of the devicespecific to the technique of anisotropic etching so that consequentlythe etching operation conducted on the device will be highlycontrollable.

Thus, with any of the above described methods, the surface ofsemiconductor devices can be planarized at a high yield regardless ofthe size of the undulations on the surface so that highly reliablesemiconductor devices may be produced.

It is still another object of the present invention to provide a methodof manufacturing semiconductor devices that solves the above identifiedproblems of the prior art and makes the control of the extent ofpolishing the device easy by using a stopper that effectively worksregardless of the polishing slurry involved, allowing a wide range ofselectable ratios of the rate of polishing the proper object to bepolished to that of polishing the stopper.

According to the present invention, the above object is achieved byproviding a method of manufacturing semiconductor devices incorporatinga process of polishing an layer formed on the substrate of the deviceand comprising a step of forming a carbon film as a stopper for thepolishing operation prior to the process of polishing the layer.

Since a carbon layer is polished at a very low rate, the use of a carbonlayer provides a large ratio of the rate of polishing the proper objectto be polished to that of polishing the stopper. When a carbon film isformed at least partly under, inside, on and/or adjacent to the targetlayer of the polishing operation as a stopper allowing a low polishingrate, the extent to which the target layer is polished can be controlledwith greater ease. Additionally, since a carbon film is highly resistiveto chemicals, it can be used regardless of the type of polishing slurryinvolved.

It is still another object of the present invention to provide a methodof manufacturing semiconductor devices that can easily and accuratelycontrol the extent to which the device is polished as well as apolishing apparatus that can be appropriately used with the method.

According to the invention, the above object is achieved by providing amethod of manufacturing semiconductor devices incorporating a process ofpolishing an layer formed on the substrate of the device and comprisingsteps of measuring the friction caused between the layer being polishedand a turntable carrying a polishing slurry during the polishingoperation, determining the rate of polishing the layer from the measuredfriction, determining the extent of polishing of the layer byintegrating the polishing rate with time and terminating the polishingoperation upon coincidence of the extent of polishing of the layer and apredetermined value.

According to the invention, the above object is also achieved byproviding a polishing apparatus comprising means for measuring thefriction caused between the layer being polished and a turntablecarrying a polishing slurry during the polishing operation, determiningthe rate of polishing the layer from the measured friction anddetermining the extent of polishing of the layer by integrating thepolishing rate with time.

Upon examining the results of a series of research activities conductedby the inventors of the present invention that provide the basis of theinvention, it was found that the friction between the layer beingpolished and the turntable carrying a polishing slurry and the rate ofpolishing the layer show a relationship of one-to-one correspondence.

By utilizing this relationship, it is now possible to measure thefriction caused between the layer being polished and a turntablecarrying a polishing slurry during the polishing operation, determinethe rate of polishing the layer from the measured friction, determinethe extent of polishing of the layer by integrating the polishing ratewith time and terminate the polishing operation upon coincidence of theextent of polishing of the layer and a predetermined value. Therefore,it is possible to provide a method of easily and accurately controllingthe extent to which the device is polished.

It is still another object of the present invention to provide anapparatus capable of accurately planarizing the surface of the wiringand the insulating layer of a semiconductor integrated circuit withoutrequiring additional steps.

According to the invention, the above object is achieved by providing apolishing apparatus for chemically and mechanically polishing the wiringand the insulating layer of a semiconductor device to planarize thesurface thereof, comprising a system of measuring the distortion of theshaft connected to the polishing turntable to determine the load due tofriction caused at the turntable, converting the measured value into anelectric signal to control the operation of the electric motor fordriving the turntable.

It is still another object of the present invention to provide apolishing apparatus capable of accurately controlling the extent towhich the target object is polished as well as a method of controllingthe extent of polishing the object.

According to the invention, the above object is achieved by providing apolishing apparatus for polishing semiconductor devices comprising aturntable provided with a polishing plane thereon, a holder devicedisposed opposite to the polishing plane for holding an target objectwith the surface to be polished facing the polishing plane, first meansfor measuring a first level of friction generated between the polishingplane and the surface of said object when the holder device is rotatedrelative to the turntable under pressure to polish the object and asecond level of friction generated between the polishing plane and thesurface of the object after a predetermined period of time, anarithmetic unit for calculating the ratio of the first level to thesecond level of friction and second means for determining the timing forredressing or replacing the polishing plane.

According to the invention the above object is also achieved byproviding a method of polishing semiconductor devices comprising stepsof providing a turntable equipped with a polishing plane disposedthereon and a holder device disposed opposite to the polishing plane andholding an target object with the surface to be polished facing thepolishing plane, rotating the turntable and the holder device, feedingthe polishing plane with a polishing slurry to polish the object under afirst polishing condition while the polishing plane frictionally andslidingly moves on the surface of the object under pressure, measuring afirst level of friction generated between the polishing plane and thesurface of the object, measuring a second level of friction generatedbetween the polishing plane and the surface of the object after apredetermined period of time, determining by calculation the ratio ofthe first level to the second level of friction and determining bycalculation a second polishing condition from the ratio to produce anextent of polishing the surface equal to the extent achieved under saidfirst level of friction.

With the above described method of the invention, a first level offriction is measured between the polishing plane and the surface of theobject as the turntable and the holder device are rotated relative toeach other under pressure and a polishing slurry is fed to the surfaceof the polishing plane so that the polishing plane frictionally slideson the surface of the object and then, after a predetermined period oftime, a second level of friction is measured to determine the ratio ofthe first level to the second level of friction. A change in thefriction between the polishing plane and the surface of the object canbe detected from this ratio and the condition of the polishing plane canbe appreciated from this change so that the timing for redressing orreplacing the polishing plane can be correctly determined.

When a target object is polished under a first polishing condition, afirst level of friction is measured between the polishing plane and thesurface of the object at a point of time and then a second level offriction is measured also between the polishing plane and the surface ofthe object after a given period of time since the point of time tocalculate the ratio of the first level to the second level of friction,which ratio is then used to determine a second condition under which therate of polishing the object is made equal to that of polishing theobject under the first condition. Thus, the rate of polishing the objectcan be kept constant by shifting the polishing condition from the firstto second condition if the state of the polishing plane has undergonechanges.

It is still another object of the present invention to provide a methodcapable of maintaining the surface condition of the polishing plane of apolishing apparatus for semiconductor devices to a desired constantlevel by effectively removing particles of the polishing slurrycontained in the polishing plane to choke the polishing plane withoutrelying on the experience of a skilled operator.

According to the invention, the above object is achieved by providing amethod of using a surface active agent to redress a degraded conditionof the polishing plane of a polishing apparatus choked with particles ofa polishing slurry in order to consistently maintaining the polishingplane to a desired state, the apparatus comprising the polishing planedisposed on a turntable, a holder device for folding a target object tobe polished with its surface facing the polishing plane and means forfeeding a polishing slurry between the polishing plane and the surfaceof the target object, the polishing plane being frictionally rotatedrelative to the surface of the target object under pressure to polishthe surface.

Additional objects and advantages of the invention will be set forth inthe description which follows, and in part will be obvious from thedescription, or may be learned by practice of the invention. The objectsand advantages of the invention may be realized and obtained by means ofthe instrumentalities and combinations particularly pointed out in theappended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute apart of the specification, illustrate presently preferred embodiments ofthe invention, and together with the general description given above andthe detailed description of the preferred embodiments given below, serveto explain the principles of the invention.

FIGS. 1A to 1E show cross section views of semiconductor structures atrespective steps of a conventional manufacturing method;

FIGS. 2A to 2C show cross section views of semiconductor structures atrespective steps of another conventional manufacturing method;

FIG. 3 shows a perspective view of a conventional polishing apparatus;

FIG. 4 shows characteristic curves between polishing time to distance,obtained by a conventional method described with reference to 2A to 2C;

FIGS. 5A to 5D show cross section views of semiconductor structures atrespective steps of a further conventional manufacturing method;

FIG. 6 shows characteristic curves between polishing time to distance,obtained by another conventional method described with reference toFIGS. 5A to 5D;

FIGS. 7A to 7B show cross section views of semiconductor structures atrespective steps of still another conventional manufacturing method;

FIGS. 8A to 8B show cross section views of semiconductor structures atrespective steps of a still further conventional manufacturing method;

FIGS. 9A to 9C show cross section views of semiconductor structures atrespective steps of a further conventional manufacturing method;

FIGS. 10A to 10D show cross section views of semiconductor structures atrespective steps of a yet further conventional manufacturing method;

FIGS. 11A to 11C show cross section views of semiconductor structures atrespective steps of a further conventional manufacturing method;

FIGS. 12A to 12E show cross section views of semiconductor structures atrespective steps of a still conventional manufacturing method;

FIG. 13 shows enlarged schematic sectional view of a polishing cloth;

FIG. 14 shows a perspective view of a conventional polishing apparatus;

FIG. 15 shows a characteristic curve between power supply voltage andcurrent through motor, of the polishing apparatus of FIG. 14;

FIG. 16 shows a characteristic curve between load and current throughmotor, of the polishing apparatus of FIG. 14;

FIG. 17 shows a characteristic curve between time of using of polishingcloth and polishing rate;

FIG. 18 shows characteristic curves between polishing time and polishingrate;

FIGS. 19A to 19F show cross section views of semiconductor structures atrespective steps of a manufacturing method of an embodiment according tothe present invention;

FIGS. 20A to 20C show cross section views of semiconductor structures atrespective steps of a manufacturing method of another embodimentaccording to the present invention;

FIGS. 21A to 21E show cross section views of semiconductor structures atrespective steps of a manufacturing method of a further embodimentaccording to the present invention;

FIGS. 22 to 27 each show characteristic curves between polishing time todistance, obtained by the manufacturing method described with referenceto FIGS. 21A to 21E;

FIG. 28 shows a cross sectional view of a semiconductor structureobtained by a still further embodiment according to the presentinvention;

FIGS. 29A to 29C show cross section views of semiconductor structures atrespective steps of a method of manufacturing the semiconductorstructure as shown in FIG. 28;

FIGS. 30A to 30C show cross section views of semiconductor structures atrespective steps of a manufacturing method of a yet further embodimentaccording to the present invention;

FIGS. 31A to 31B show cross section views of semiconductor structures atrespective steps of a manufacturing method of a further embodimentaccording to the present invention;

FIGS. 32A to 32C show cross section views of semiconductor structures atrespective steps of a manufacturing method of a further embodimentaccording to the present invention;

FIGS. 33A to 33J show cross section views of semiconductor structures atrespective steps of a manufacturing method of a still further embodimentaccording to the present invention;

FIGS. 34A to 34I show cross section views of semiconductor structures atrespective steps of a manufacturing method of a yet further embodimentaccording to the present invention;

FIG. 35 shows a perspective view of a polishing apparatus of anembodiment according to the present invention;

FIG. 36 shows characteristic curves between polishing time and polishingrate, and characteristic curves between polishing time and currentthrough motor;

FIG. 37 shows a characteristic curve between current through motor andpolishing rate;

FIG. 38 shows a characteristic curve between friction betweento-be-polished layer and turntable, on one hand, and polishing rate, onthe other hand;

FIG. 39 shows a characteristic curve between the number of rotation ofturntable and holding device and polishing rate;

FIG. 40 shows a perspective view of a polishing apparatus of anembodiment according to the present invention;

FIG. 41 shows a characteristic curve between load and distortion;

FIGS. 42 and 43 show cross section views of semiconductor structures ata step of a manufacturing method;

FIG. 44 shows a perspective view of a polishing apparatus of anembodiment according to the present invention;

FIG. 45 shows a flow chart performed in the controller of the polishingapparatus as shown in FIG. 44;

FIG. 46 shows characteristic curves between current through motor andpolishing rate;

FIG. 47 shows a characteristic curve between time of using of polishingcloth and polishing rate, and a characteristic curve between time ofusing of polishing cloth and polishing amount;

FIG. 48 shows a characteristic curve between time of using of polishingcloth and polishing rate, and a characteristic curve between time ofusing of polishing cloth and current through motor;

FIG. 49 shows a perspective view of a polishing apparatus of anembodiment according to the present invention;

FIG. 50 shows a perspective view of a polishing apparatus of anembodiment according to the present invention; and

FIG. 51 shows a characteristic curve between time of using of polishingcloth and polishing rate.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

Now, the present invention will be described in greater detail by way ofexamples and reference will be made to the accompanying drawings thatillustrate some of the best modes of carrying out the invention.

FIGS. 19A through 19F schematically illustrate a semiconductor device incross section in a number of different steps of planarizing itsinsulating film interlayer in a mode of carrying out the invention.

As shown in FIG. 19A, an SiO₂ film 202 is formed to a thickness of 1 μmon an Si substrate 201 carrying certain elements (not shown) on thesurface. Thereafter, a 500 μm thick polysilicon film 203 is formed onthe SiO₂ film 202.

Then, as shown in FIG. 19B, a photoresist (photosensitive resincontaining agent) is applied to the polysilicon film 203 to form a layerhaving a thickness of 1.5 μm and the formed photoresist layer is exposedto light with a mask pattern (not shown) arranged thereon. Then, aphotoresist pattern 204 will be produced by developing the layer.

Subsequently, as shown in FIG. 19, the polysilicon film 203 is subjectedto a patterning operation, using the photoresist pattern 204 as a maskand also using an RIE technique and CF₄ gas.

Thereafter, as illustrated in FIG. 19D, the photoresist pattern 204 isremoved and reduced to ash in a down flow type asher, where microwavesare discharged into a gaseous mixture of CF₄ and O₂ to which thephotoresist is exposed. Then, as illustrated in FIG. 19E, an SiO₂ film205 is formed on the entire surface of the processed substrate to athickness of 1 μm to produce an insulating film interlayer. The SiO₂film 205 showed projections and recesses on the surface reflecting thepattern of the polysilicon wiring 203.

Subsequently, the SiO₂ film 205 is polished or scraped until it shows across section as illustrated in FIG. 19F. A polishing apparatus as shownin FIG. 3 is normally used for the polishing operation. This apparatuscomprises a turntable 502, a polishing cloth 504 and a polishing slurryfeeding pipe 503 whose front end is located at the center of thepolishing cloth 504. As the turntable 502 is rotated counterclockwisearound its axis as indicated by an arrow at a rate of 100 rpm, thepolishing slurry is fed onto the polishing cloth 504 from the front endof the pipe 503. A wafer 1 is pressed against the polishing cloth 504 bya load of 40 kgf while it is rotated with the turntable in the sense asindicated by the arrow also at a rate of 100 rpm. The polishing slurryis a suspension prepared by dispersing powder containing particulatecerium oxide into water, the particles having an average diameter of 1.2μm and a maximum diameter of 4.0 μm and being obtained by crushing andsintering bastnaesite. The powder contains cerium oxide by about 50 wt %and oxides of other rare earth metals by about 37 wt %. Table 1 belowlists the contents of the powder used in an example.

                  TABLE 1                                                         ______________________________________                                        Particulate CeO.sub.2 (ICP Mass/emission spectrochemical                      ______________________________________                                        analysis)                                                                     Impurity    100,000-     Ce, La                                               concentration                                                                              10,000-100,000                                                                            Pr                                                                1,000-10,000                                                                              Ca, P, S, Fe, Sr, Nd,                                                         Sm, Eu, Gd, Th                                                      100-1,000 Al, Si, Mn, Y, Nb, Tb,                                                        Dy, Pb                                                              10-100    Na, Li, Cr, Zr, Sb, U                                                1-10     Ba, Co, Ni, Mo, W                                                    -1 ppm   B, Ru, Pd, Ag, Cd, In,                                                        Sn, Te, I, Cs, Re, Os,                                                        Ir, Pt, Au, Hg, Tl, Bi                               ______________________________________                                    

After polishing the surface of the insulating film with a polishingslurry containing cerium oxide, it was found to have been completelyplanarized. When observed through a differential interference typemicroscope, it showed no scars on the surface.

In another example where a polishing slurry of suspension prepared bydispersing a powdery material into water by 1 wt % was used, the powderymaterial containing cerium oxide particles with an average diameter of2.5 μm and a maximum diameter of 12.0 μm by 1 wt % into water, thesurface of the insulating film was found to have been completelyplanarized, although it showed four scars per 10 cm³ when observedthrough a differential interference type microscope.

In still another example where a polishing slurry of aqueous suspensionprepared by dispersing a powdery material into water by 1 wt % was used,the powdery material containing cerium oxide particles having an averagediameter of 2.5 μm and a maximum diameter of 12.0 μm and produced bycrushing and sintering bastnaesite in a manner as described above, thesurface of the insulating film showed a scar per 10 cm³ when observedthrough a differential interference type microscope.

From the above examples, it will be understood that an insulating filmof a semiconductor device can be completely planarized by polishing itssurface with a polishing slurry containing cerium oxide and thatappearance of scars on the surface can be effectively prevented if thepolishing slurry contains only small particles preferably having amaximum diameter of less than 4 μm and by using soft particles obtainedby appropriately adjusting the condition where the raw material issintered.

Table 2 below shows the result of an impurity analysis carried out byusing the technique of atomic absorption spectrometry in an examplewhere a silicon oxide film having a film thickness of 1 μm and preparedby oxidizing silicon by heat and a silicon oxide film having a filmthickness of 1 μm and containing phosphor and boron to a highconcentration (hereinafter referred to as BPSG) were polished to reducethe thickness by 0.5 μm with a polishing slurry of aqueous suspensionprepared by dispersing particles into water by 1 wt %, the particlescontaining cerium oxide and having an average particle diameter of 2.5μand a maximum particle diameter of 12.0 μm. For reference, the result ofa polishing operation using Compol-80 is also shown.

                  TABLE 2                                                         ______________________________________                                        Polished Polishing                                                            film     slurry      Na      K     Fe   Ce                                    ______________________________________                                        Thermally                                                                              not polished                                                                              2.0     2.0    0.5 --                                    oxidized (ref)                                                                film                                                                          Thermally                                                                              Compol-80   36.0    6.0   24.5 --                                    oxidized                                                                      film                                                                          Thermally                                                                              cerium oxide                                                                              2.0     2.0    0.5 1 or                                  oxidized                                less                                  film                                                                          BPSG     not polished                                                                              6.5     3.0    9.0 --                                             (ref)                                                                BPSG     Compol-80   1000 or 9.0   35.0 --                                                         above                                                    BPSG     cerium oxide                                                                              7.0     3.0   11.0 1 or                                                                          less                                  ______________________________________                                    

As it is clear from Table 2 above, the thermally oxidized silicon filmpolished by Compol-80 shows a level of sodium contamination higher thanthat of the unpolished silicon film tested for reference (or the levelsnormally quoted in reference books) by an order of magnitude and theBPSG film polished by Compol-80 shows a level of sodium contaminationhigher than that of unpolished silicon film by two order of magnitude.

To the contrary, both the thermally oxidized silicon film and BPSG filmpolished by the cerium oxide containing polishing slurry are notcontaminated by sodium any more than the unpolished silicon films(showing the levels of contamination normally quoted in referencebooks). This holds true for the other contaminant elements. As forcerium, the cerium contamination levels of the films treated by thecerium oxide containing polishing slurry were less than 1×10¹⁰atoms/cm². Although the cerium oxide containing polishing slurry wasprepared by crushing and sintering bastnaesite and not treated to removealkali metals, the insulating films were not contaminated by alkalimetals after having been polished by the slurry, proving that the use ofsuch a polishing slurry does not adversely affect the semiconductordevices polished by such a slurry.

Table 3 below shows the rates of polishing a silicon oxide film obtainedby thermally oxidizing silicon, a silicon nitride film and a BPSG filmwith a polishing slurry of aqueous suspension prepared by dispersingparticles into water by 1 wt %, the particles containing cerium oxideand having an average particle diameter of 2.5μ and a maximum particlediameter of 12.0 μm. For reference, the results obtained by polishingidentical specimens with Compol-80, a basic polishing slurry of aqueoussuspension prepared by dispersing silica particles having a diameter of12 nm by 5 wt % into water, a slurry obtained by adding ammonia by 10 wt% to the basic polishing slurry and another slurry obtained by addingsodium hydroxide by 0.2 wt % to the basic polishing slurry are alsolisted in Table 3.

                  TABLE 3                                                         ______________________________________                                        Polishing slurry/                                                             polished film                                                                             SiO.sub.2 film                                                                            SiN film BPSG film                                    ______________________________________                                        cerium oxide                                                                              1,000       300      1,200-1,300                                  Compol-80   110          40      200                                          φ12 nm SiO.sub.2 5 wt %                                                                6                                                                suspension                                                                    φ12 nm SiO.sub.2 5 wt %                                                               18                                                                plus NH.sub.3 10 wt %                                                         suspension                                                                    φ12 nm SiO.sub.2 5 wt %                                                               50                                                                plus NaOH 0.2 wt %                                                            suspension                                                                    ______________________________________                                         Unit of polishing rate  nm/min                                           

As listed on Table 3, the rate of polishing with Compol-80 a siliconoxide film obtained by oxidizing silicon by heat was 110 nm/min, whereasthat of polishing an identical silicon oxide film with the basicpolishing slurry of aqueous suspension containing silica particleshaving a diameter of 12 nm by 5 wt % was as low as 6 nm/min. Thepolishing rate of the polishing slurry obtained by adding sodiumhydroxide by 0.2 wt % to the basic slurry was as high as 50 nm/min,while that of another polishing slurry obtained by adding ammonia by 10wt % to the basic slurry was 18 nm/min, showing that the effect ofadding ammonia was not as remarkable as that of adding sodium hydroxide.The rates of scraping or polishing a silicon nitride film and a BPSGfilm with Compol-80 were respectively 40 nm/min and 200 nm/min.

Thus, for instance, it takes approximately 5 minutes to remove a siliconoxide film obtained by thermally oxidizing silicon and having athickness of 500 nm from the surface of a semiconductor device bypolishing with Compol-80 and approximately ten minutes to remove thesilicon oxide film with the polishing slurry of aqueous suspensioncontaining silica particles having a diameter of 12 nm by 5 wt % andsodium hydroxide by 0.2 wt %, while it takes approximately 30 minutes toremove the silicon oxide film with the polishing slurry containingammonia by 10 wt %, proving that the polishing technique involving theuse of any of these polishing slurries is a rather time consuming one.

Contrary to this, when a polishing slurry of aqueous suspensioncontaining cerium oxide particles having an average diameter of 2.5 μmand a maximum diameter of 12.0 μm by 1 wt % is used, remarkably highpolishing rates of 300 nm/min and 1,200 to 1,300 nm/min are achievedrespectively for a silicon nitride film and a BPSG film so that thesefilms can be removed in 0.5 and 2 minutes respectively if they have athickness of 500 nm. Thus, this polishing slurry is very promising fromthe view point of industrial applications in terms of filmscraping/polishing rate.

While the polishing slurry used in the above examples was prepared forthe purpose of the invention by crushing and sintering bastnaesite toproduce a powdery material containing cerium oxide and disperse thepowdery material in water and contained cerium oxide by 50 wt % andoxides of other alkali metals by 37 wt %, for the purpose of the presentinvention, a polishing slurry containing cerium oxide may be preparedfrom any other appropriate materials by using any other appropriatetechnique and the suspension may contain those ingredients to differentconcentrations. While the insulating films polished by the abovepolishing slurry were silicon oxide films obtained by thermallyoxidizing silicon, the polishing slurry may also be effectively used forinsulating films of other types such as silicon oxide films obtained bychemical vapor phase expitaxy and silicon nitride films as well asinsulating films comprising a conductive film as part thereof.

As is obvious from the above examples, insulating films such as siliconoxide films and silicon nitride films can be scraped and polished at anenhanced rate by a cerium oxide containing polishing slurry.Advantageously, the use of such a polishing slurry does not contaminatethe inside of the film with alkali metals. Still advantageously, aninsulating film having undulations on the surface can be effectivelypolished to become planar without producing scars on the surface whensuch a polishing slurry is used. Thus, the use of such a polishingslurry is feasible for practical applications in the field of polishinginsulating films in the process of manufacturing semiconductor devicesas it solves the problems identified in the above description of thisspecification.

FIGS. 20A through 20C schematically illustrate a semiconductor device incross section in different steps of planarizing its insulating filminterlayer in a mode of carrying out the present invention which isdifferent from that of FIGS. 19 through 19F. After forming an insulatingfilm 212 on a semiconductor device 210 comprising a semiconductorsubstrate 201 to cover the entire surface of the substrate, theinsulating film is polished or scraped on a polishing apparatus having aconfiguration as illustrated in FIG. 3 to produce a planar surface asshown in FIG. 20C. The polishing slurry used for this operation in anexample contained CeO₂ and H₂ O as major ingredients along withimpurities such as Na, Mg, Al, K, Ca, Ti, Cr, Fe, Ni, Zr, W, Pb, Th andU to a concentration less than 100 ppm. The concentration of eachingredient was determined by ICP mass spectroscopy.

It was proved that, by using a highly pure polishing slurry containingimpurities only to a negligible extent, the semiconductor device can beeffectively prevented from contamination by such impurities if the waferof the device is brought in touch with the polishing slurry during thepolishing operation or the latter is partly left on the surface of thewiring layer after the polishing operation. Table 4 below shows thelevels of contamination of a silicon oxide film by impurities determinedby atomic absorption spectrometry when it is polished by a method of theinvention and a conventional method. As is apparent from Table 3, theconcentrations of K, Al, Cr and Ni were below the detectable level andthose of Na, Ca and Fe were practically negligible, or 2.3, 0.9 and3.4×10¹⁰ atoms/cm² respectively which are by far lower than thecorresponding levels for the conventional method, to make thesemiconductor device practically free from the fear of contaminationwhen the above described polishing mode of the present invention wasused. Thus, with such a polishing mode, the semiconductor device doesnot require a protective film to be formed therein and therefore theoverall process of manufacturing semiconductor devices can be simplifiedto boost the productivity of the process.

                  TABLE 4                                                         ______________________________________                                               Contaminant metal element                                                     Na     K     Ca      Al  Fe     Cr  Ni                                 ______________________________________                                        This     2.3      --    0.9   --  3.4    --  --                               invention                                                                     Known    60       90    3.5   33  45     2.7                                  method                                                                        ______________________________________                                         unit: 10.sup.10 atoms/cm.sup.2                                                --: below the detectable level                                           

Still another mode of carrying out the method of polishing andplanarizing an insulating film interlayer of a semiconductor deviceaccording to the invention will now be described by referring to FIGS.21A through 21E illustrating schematically a semiconductor device incross section in different steps of planarization.

Referring firstly to FIG. 21A, an SiO₂ film 202 is formed by depositionas a ground coat on an Si substrate 201 carrying required elements (notshown) thereon.

Then, as illustrated in FIG. 21B, an Al wiring layer 206 is selectivelyformed on the SiO₂ film 202 to a thickness X (FIG. 21D) of 1.1 μm.

Thereafter, as shown in FIG. 21C, another SiO₂ film 207 is formed bydeposition to a thickness of about 1.2 μm on the entire surface of thesubstrate including the areas carrying the Al wiring layer 206.

Subsequently, as shown in FIG. 21D, a polysilicon film (a stopper film)208 which is more resistive than the SiO₂ film 207 to polishing isformed by deposition to a thickness T of approximately 0.1 μm on theSiO₂ film 207.

Then, the polysilicon film 208 and the SiO₂ film 207 are polished orscraped by using a polishing apparatus of the type as illustrated inFIG. 3. A polishing slurry of aqueous suspension containing cerium oxideby 1 wt % will typically be used.

In an example involving an experiment and still another mode of carryingout the polishing method of present invention, an SiO₂ film 207 could becompletely planarized by using the above described polishing slurry.

FIG. 22 shows a graph illustrating the result of an experiment carriedout for the example. The specimen used for this example comprised 500 μmwide Al wires 206 formed at a pitch of 1,000 μm. In the graph of FIG.22, the abscissa represents the elapse of time (seconds) after the startof a polishing operation as illustrated in FIG. 21E while the coordinaterepresents the distance between the surface of the first SiO₂ film 202and that of the second SiO₂ film 207.

Before the start of the polishing operation, the distance between thesurface of the projected or raised areas of the first SiO₂ film 202where the Al wires 206 were located and that of the second SiO₂ film 207(as indicated by a solid line in FIG. 22) and the distance separatingthe surface of the recessed areas of the first SiO₂ film 202 where therewere no Al wires 206 from that of the second SiO₂ film 207 (as indicatedby a broken line in FIG. 22) were same and equal to 1.1 μm which wasalso the thickness of the Al wires 206.

As the polishing operation began, the polysilicon film 208 was polishedfirstly at the projected areas and, after about 30 seconds, its wascompletely removed at these areas to expose the SiO₂ film 207 thereat.The polysilicon film 208 was removed preferentially at the projectedareas simply because the load applied to the film 208 was greater at theprojected areas than at the recessed areas.

Then, the SiO₂ film 207 started to be polished at the areas where therewas no polysilicon film 208, while polysilicon film 208 was furtherpolished at the recessed areas. However, the polysilicon film 208remained at the recessed areas without being completely removedtherefrom while the SiO₂ film 207 was being polished because the loadapplied to the recessed areas was smaller than that applied to theprojected areas.

As the operation of polishing the SiO₂ film 207 proceeded at theprojected areas, the undulations on the surface of the SiO₂ film 207became less conspicuous. When about 100 seconds passed since the startof the polishing operation, the recessed areas of the polysilicon film208 completely disappeared to produce a substantially planar surface forthe SiO₂ film 207. In other words, the SiO₂ film 207 was made planarwith a minimum amount of scraping work and without giving rise to a"dishing" phenomenon.

After the SiO₂ film 207 was made planar in 100 seconds after the startof the polishing operation, no undulations appeared and the polishingwent ever since on smoothly on a planar surface of the SiO₂ film 207.

In the above described example, the use of a polysilicon film 208 whichwas formed on the SiO₂ film and more resistive to scraping than the SiO₂film made it possible to planarize the surface of the SiO₂ film withminimum amount of polishing work. Additionally, once the SiO₂ film 207was planarized, it remained the planar surface condition if thepolishing operation continued thereat.

While a polysilicon film 208 having a thickness of 0.1 μm was used inthis example, a wide margin of thickness may be afforded to such apolysilicon film because it is polished at recessed areas at a ratecorresponding to the polishing rate for projected areas. As a matter offact, a similar effect of planarization was obtained in a supplementaryexperiment using polysilicon films that were 0.08 μm and 0.15 μm thick.

The above describe mode of carrying out the method of the presentinvention is highly feasible for practical applications since it affordsa wide margin of film thickness for the polysilicon film 208 and doesnot require the formation of a stopper film such as a silicon nitridefilm normally which is used for known conventional methods to make themcomplicated and costly.

Additionally, as a result of a series of research studies carried out bythe inventors of the present invention, it was found that any SiO₂ filmsto be polished show a performance similar to the one illustrated in FIG.22 regardless of the width and the pitch of arrangement of the wires.

FIGS. 23 through 27 are graphs that are similar to the graph of FIG. 22and illustrate the changes with polishing time of the distance betweenthe surface of the projected areas of the ground layer of a SiO₂ filmand the surface of the other SiO₂ film to be treated and the distanceseparating the surface of the recessed areas of the ground layer of theSiO₂ film from that of the SiO₂ film to be treated for the wirewidth/the wiring pitch of 2, 50, 100, 200 and 500 respectively.

It is understood from FIGS. 23 through 27 that the SiO₂ film to betreated is not polished at the recessed areas of the surface in theinitial stages of the polishing operation and then begins to be polishedat a rate equal to that at which the film is polished at the projectedareas of the surface when a certain period of time has passed since thestart of the operation.

It should be noted that various modifications can be made to the abovedescribed mode of carrying out the invention. For instance, while thetarget film to be treated is an SiO₂ film and the stopper film was apolysilicon film in the above description, they may be films made ofmaterials other than those described above. An appropriate polishingslurry other than the one containing cerium oxide may be used.

Table 5 below shows a list of various polishing slurries (a 1 wt %suspension of cerium oxide and colloidal silica containing dispersedSiO₂ particles) and target films (an undoped SiO₂ film, an SiN film, apolysilicon film, a carbon film and an SiO₂ film containing B and P) aswell as their possible combinations and corresponding rates of polishingthe target film.

                  TABLE 5                                                         ______________________________________                                        Polishing Rate (nm/min)                                                       Target                                                                        film    SiO.sub.2        Poly-        SiO.sub.2                               polishing                                                                             film     SiN     silicon                                                                             carbon film                                    slurry  (undoped)                                                                              film    film  film   (con. B&P)                              ______________________________________                                        Cerium  700      300     120   <50    930                                     oxide                                                                         suspension                                                                    (1 wt %)                                                                      Colloidal                                                                             160      500     330   <50    550                                     silica                                                                        ______________________________________                                    

From Table 5 above, it will be understood that, when a cerium oxidesuspension and an undoped SiO₂ film are used respectively for thepolishing slurry and the target film, the stopper film showing a lowpolishing rate can be selected from a polysilicon film, a siliconnitride film and a carbon film.

While an insulating film was the target film to be treated in the abovedescription, the method of the present invention can also be applied toa metal film. If such is the case, a W film and a Cu film will be formedsequentially on the entire surface of an SiO₂ film carrying groovesthereon by deposition as a film to be polished and a film resistive topolishing respectively. With such an arrangement, the polishing slurryto be used can have a wide choice because the Cu film is polished at arate sufficiently lower than the rate at which the W film is polished.Likewise, the method of the present invention can be applied to devicescomprising but a semiconductor substrate other than an Si substrate or asemi-insulating substrate.

As described heretofore in detail, the above mode of carrying out themethod of the present invention is not accompanied by the problem ofdishing nor any additional processing steps to planarize a film becausethe film to be polished is planarized by polishing the film to beplanarized simultaneously with a stopper film that has been formed onthe film to be planarized.

FIG. 28 shows a cross sectional view of a semiconductor device which ismanufactured by a further manufacturing method according to the presentinvention. A method of manufacturing the semiconductor device shown inFIG. 28 is described hereinafter with reference to FIGS. 29A to 29C.FIGS. 29A to 29C show semiconductor structures at respective steps ofmanufacturing the semiconductor device shown in FIG. 28. The finishedsemiconductor structure shown in FIG. 29C is the same as that as shownin FIG. 28.

Referring firstly to FIG. 29A, a thermally oxidized film 202 is formedby oxidizing the surface of a substrate 201 which is normally asemiconductor substrate. Then, a conductive layer 203 typically made ofpolysilicon is formed on the thermally oxidized film 202. Subsequently,a resist layer 204 is selectively formed on the conductive layer 203 andthe thermally oxidized film 202, the conductive layer 203 and thesemiconductor substrate 201, if required, are selectively removed byusing said resist layer 204 as a mask to produce recesses or recessedportions 215 and 216 in the form of trenches. The recess 216 is a trenchwider than the recesses 215.

Thereafter, as illustrated in FIG. 29B, an insulating film 217 is formedby a known CVD technique on the entire surface of the device includingthe recesses 215 and 216. Note that, in FIG. 29B, the semiconductorsubstrate 201 is also selectively removed so that the recesses 215 and216 extend deep into the substrate 201. The insulating film 217 has athickness greater than the height of the recesses 215 and 216.

Then, a polishing or scraping operation is started from the surface ofthe insulating film 217 by a chemical mechanical polishing technique.More specifically, the wafer is held upside down by a holder and pressedagainst a polishing cloth rotating on a turntable, to which a polishingslurry containing fine particles of cerium oxide is constantly fed, sothat the insulating film 217 may be polished off first. Alternatively,the wafer may be held in an upright position or housed in a wafercarrier so that it may be polished at the top and bottom simultaneously.Since the conductive film 203 which is a polysilicon film operates as astopper that retards the rate at which it is polished, the polishingoperation needs to be stopped at this stage to see that the entiresurface of the device has been completely planarized and the recesses215 and 216 have disappeared as shown in FIG. 29C.

The material to be used for the conductive film 203 may not necessarilybe polysilicon and may alternatively be selected from a group ofmaterials including silicide, carbon, amorphous silicon, titaniumnitride and multilayer structures of any of these substances if thesurface of the formed film operates as a stopper for the polishingoperation.

Colloidal silica is most popularly used for the polishing slurry. Thisis mainly because any commercially available colloidal silica ismaintained to a weak alkaline condition to show a pH value of around 10.With any conventional polishing methods, no satisfactory polishing ratewill be achieved for the insulating film if the pH value issignificantly shifted from that level. With the above described mode ofcarrying out the invention, on the other hand, a satisfactory polishingrate is ensured for the insulating film when the polishing slurry showsa neutral pH level of around 7 only if the slurry contains fine ceriumoxide particles. One of the advantages of using a polishing slurryshowing a neutral pH level is that, if the conductive fiim that operatesas a stopper has one or more than one tiny holes and an easilycorrodible layer such as an aluminum wiring layer is disposedthereunder, a neutral polishing slurry would not dissolve, if partly,the under layer to cause it to flow out.

Table 6 below lists different conductive films that may be used for thepurpose of the present invention and the rates at which they arepolished as expressed in absolute and relative terms.

                  TABLE 6                                                         ______________________________________                                                        Polishing                                                                              Rate selectivity                                                     rate     heat-oxidized                                        Type of film    (A/min)  film = 1)                                            ______________________________________                                        BPSG            9,300    0.68                                                 Polysilicon     1,100    5.7                                                  SiN             2,400    2.6                                                  Heat-oxidized film                                                                            6,300    1                                                    ______________________________________                                    

From the above table, it will be found that, when the insulating film isan oxide film in particular, a polysilicon film having a rateselectivity of 5.7 may suitably be used as a conductive film thatoperates as a stopper when the oxide film is polished. If a nonconductive film is required as a polishing stopper, then a siliconnitride film having a rate selectivity of 2.6 will provide a goodchoice, although the use of a polishing slurry having a rate selectivityof greater than 5 is more preferable.

When a silicon nitride film is used for the insulating film, inparticular, the use of a polishing slurry as a polishing stopper will bea good choice because the rate selectivity of a polysilicon film isapproximately 2.2 if that of a silicon nitride film is 1.

If a conductive film is used as a polishing stopper, it preferably showsa large rate selectivity, most preferably greater than 5, relative tothat of the target layer to be polished.

Thus, the insulating film of a semiconductor device of the type underconsideration can suitably be polished by chemical mechanical polishingusing a polishing slurry containing cerium oxide if a thermally oxidizedfilm is laid under the conductive film.

Now, still another mode of carrying out the present invention will bedescribed by referring to FIGS. 30A through 30C, which illustratedifferent steps of planarizing a semiconductor device.

Referring firstly to FIG. 30A, a wiring layer 222 is formed on asupporting substrate 201 which is normally a semiconductor substrate anda conductive film 203 typically made of polysilicon is formed on thewiring layer 222. Subsequently, a resist layer 204 is selectively formedon the conductive layer 203 and the thermally oxidized film 202 and theconductive layer 203 are selectively removed by using the resist layer204 as a mask to produce recesses 215 and 216. The recess 216 is atrench wider than the recesses 215. Thereafter, as illustrated in FIG.30B, an insulating film 217 is formed by a known CVD technique on theentire surface of the device including the recesses 215 and 216. Theinsulating film 217 has a thickness greater than the height of therecesses 215 and 216. Then, a polishing or scraping operation is startedfrom the surface of the insulating film 217 by a chemical mechanicalpolishing technique. More specifically, the wafer is held upside down bya holder and pressed against a polishing cloth rotating on a turntable,to which a polishing slurry containing fine particles of cerium oxide isconstantly fed, so that the insulating film 217 may be polished first.Alternatively, the wafer may be held in an upright position or housed ina wafer carrier so that it may be polished at the top and bottomsimultaneously. Since the conductive film 203 which is a polysiliconfilm operates as a stopper layer that retards the rate at which it isscraped, the polishing operation needs to be stopped at this stage tosee that the entire surface of the device has been completely planarizedand the recesses 215 and 216 have disappeared as shown in FIG. 30C.

Thus, the insulating film of a semiconductor device of the type underconsideration can suitably be polished by chemical mechanical polishingusing a polishing slurry containing cerium oxide if a thermally oxidizedfilm is laid under the conductive film.

Now, still another mode of carrying out the present invention will bedescribed by referring to FIGS. 31A and 31B, which illustrate differentsteps of planarizing a semiconductor device.

Referring firstly to FIG. 31A, a wiring layer 222 comprising a number ofwire sections is selectively formed on a supporting substrate 201 whichis normally a semiconductor substrate and an insulating film 223 and aconductive film 224 are sequentially formed on the wiring layer 222.subsequently, the insulating film 223 and the conductive layer 224 areselectively removed to produce recesses 225, where the wiring layer 222is exposed. Then, an aluminum wiring layer 225 is formed on theconductive film 224 and the exposed wiring layer 222 to a thicknessgreater than the depth of the recesses 222. Then, a polishing orscraping operation is started from the surface of the wiring layer 226by using a chemical mechanical polishing technique. More specifically,the wafer is held upside down by a holder and pressed against apolishing cloth rotating on a turntable, to which a polishing slurrycontaining fine particles of cerium oxide is constantly fed, so that thewiring layer 226 may be polished first. Alternatively, the wafer may beheld in an upright position or housed in a wafer carrier so that thewafer may be polished at the top and bottom simultaneously. Since theconductive film 224 operates as a stopper layer that retards the rate atwhich it is polished, the polishing operation needs to be stopped atthis stage to see that the entire surface of the device has beencompletely planarized and the recesses have disappeared or the wiringlayer 226 remains only in the recesses 225 as shown in FIG. 31B.

The conductive layer 224 is preferably made of polysilicon as iteffectively operates as a stopper.

While a conductive layer 224 is formed on an insulating film 223 so thatthe former may operates as a stopper layer when the device is polishedin the above mode, the use of such a conductive layer 224 may be omittedif the surface of the insulating film 222 subjected to a polishingoperation functions as a stopper.

Note that the wiring layer can be chemically and mechanically polishedin the above described mode.

Now, still another mode of carrying out the present invention will bedescribed by referring to FIGS. 32A through 32C, which illustratedifferent steps of planarizing a semiconductor device.

Referring firstly to FIG. 32A, a number of projections 231 including anumber of elements such as a semiconductor polycrystalline layer,capacitors and electrodes are formed on a substrate 201 which isnormally a semiconductor substrate and then a first insulating film 232is formed on the entire surface of the semiconductor substrate 201carrying the patterned projections 231 to produce a flat surface.Thereafter, a wiring layer 234 is selectively formed on the firstinsulating film 232 and then an amorphous silicon layer 233A which is tobe transformed to a second insulating film is formed by deposition onthe entire surface of the first insulating film 232 including the areaswhere the wiring layer 234 is formed. Subsequently, a third insulatingfilm 235 is formed on the amorphous silicon layer 233A to a height atleast greater than that of the wiring layer 234. Then, the device ischemically and mechanically polished or scraped, starting from thesurface of the third insulating film 235. More specifically, the waferis held upside down by a holder and pressed against a polishing clothrotating on a turntable, to which a polishing slurry containing fineparticles of cerium oxide is constantly fed, so that the thirdinsulating film 235 may be polished first. Alternatively, the wafer maybe held in an upright position or housed in a wafer carrier so that thewafer may be polished at the top and bottom simultaneously. Asillustrated in FIG. 32B, the amorphous silicon film 233A which is to betransformed to a second insulating film operates as a stopper layer thatretards the rate at which it is polished so that the layer 233A and thethird insulating film 235 are completely planarized. Since the amorphoussilicon layer 233A is conductive, it is oxidized and transformed to asecond insulating film 233 after the polishing operation as illustratedin FIG. 32C.

Amorphous silicon can be made to take the form of a film at temperaturebelow 400° C. This means that the amorphous silicon film can maintainits form even when an aluminum wiring layer 234 is laid under the secondinsulating film 233 in the above mode of operation. Thus, this mode ofcarrying out the invention is particularly suited to produce amultilayer structure in a situation where polysilicon films that need tobe formed at high temperature around 800° C. may not be used. The secondinsulating film 233 can be formed as a stopper layer on the wiring layer234 without any technical difficulties.

The above described mode of operation may also be advantageously used inother than a multilayer environment where polysilicon wires and/orelectrodes are used in place of a wiring layer 234 particularly when aninsulating film that covers the polysilicon wires and/or the electrodesneeds to be planarized because, if such is a case, the polysilicon wiresand/or the electrodes themselves operate as a stopper to allowsimplification of the entire manufacturing process.

Since any of the modes of operation of planarizing a semiconductordevice described above do not involve etching or reflow, the device canbe completely planarized regardless of the size of the recesses andprojections it carries on the surface. Additionally, since a neutralpolishing slurry containing cerium oxide is used, the layer underlyingthe one being polished is free from the fear of corrosion if touched bythe slurry so the device can be safely polished from its projected areasuntil it is completely planarized.

Additionally, with the method of the present invention, semiconductordevices can be accurately polished to planarize the surface by forming astopper layer typically made of an insulating film at any level at whichthe polishing operation desirably needs to be stopped in a controlledmanner. Thus, the device will be completely planarized even if itoriginally carries a number of projections and recess on the surface sothat a subsequently patterning operation will be advantageously carriedout. Specifically, when the device is subjected to a patterningoperation for wiring in a subsequent step, it will be completely freefrom any possibility of producing thinned wires as a result ofdifferences in the focal depths of the optical system for opticallyexposing the device attributable to the undulations on the surface ofthe device. By, in particular, laying an insulating film directly on theelectrodes of the device as a stopper layer, the device will not beprotected against any possible adverse effects that the subsequentprocessing operations may exert on the device if the electrodes aresurrounded by an even more complicated structure than those we see todayas expected in the future. Then, consequently interlayer wiringoperations as well as operations of forming interlayer insulating filmsmay be carried out in an appropriately and accurately manner than everto accommodate any requirements for higher integration and down-sizingin the future.

Additionally, since the method of the present invention is applicable tothe operation of not only polishing insulating films but also wiringmaterials to expand the scope of applicability of the present invention.

Consequently, the method of the present invention can reduce the costand raise the yield of manufacturing semiconductor devices.

The method of the present invention is also advantageous in that thestopper layer of the semiconductor device can be selected fromconductive polysilicon films, high resistive amorphous silicon films andvarious silicide material films.

As understood from the foregoing, the method of the present inventionenables planarization of a semiconductor device in a neutral environmentregardless of the size of the projections i.e. raised portions andrecesses i.e. recessed portions to ensure a high yield and an enhancedreliability in the field of manufacturing semiconductor devices.

Now, a still another mode of carrying out the present invention will bedescribed by referring to FIGS. 33A through 33J which illustratedifferent steps of planarizing an insulating film interlayer of asemiconductor device.

Referring firstly to FIG. 33A, an SiO₂ film 202 is formed to a thicknessof 1 μm on the surface of a semiconductor substrate 201 on whichsemiconductor elements (not shown) are formed. Then, a 500 nm thickpolysilicon film 203 is formed on the SiO₂ film 202.

Thereafter, as illustrated in FIG. 33B, a 100 nm thick carbon film 244is formed as a stopper layer on the polysilicon wiring film 203 in an Aratmosphere by DC magnetron spattering, using a graphite plate as target.The conditions under which the carbon film 244 is formed include apressure of 4 mTorr, a power supply rate of 3.5 W/cm² and an Ar flowrate of 40 SCCM. In an experiment conducted to examine the structure ofa specimen of the carbon film 244 by X-ray diffraction, it was foundthat the film was amorphous or finely crystalline. The specificresistance of the film was 0.75 Ωcm when measured by a four-probemethod.

Then, as shown in FIG. 33C, photo resist is applied to the carbon film244 to a thickness of 1.5 μm to form a photo resist (photo-sensitiveresin) layer 245. Subsequently the photo resist 245 is exposed to lightwith a mask pattern (not shown) placed thereon and then subjected to adevelopment operation to remove the exposed areas of the carbon film 244and produce a photo resist pattern 245.

A patterning operation is then carried out on the carbon film 244 bymeans of RIE using O₂ gas and also using the photo resist pattern 245 asa mask as illustrated in FIG. 33D. Then, as shown in FIG. 33E, anotherpatterning operation is carried out on the polysilicon wiring film 203also by means of RIE but using CF₄ gas this time.

Then, as shown in FIG. 33F, the photo resist pattern 245 is removed by adown flow type asher in which microwaves are discharged in the gaseousmixture of CF₄ and O₂. Thereafter, as shown in FIG. 33G, a 1 μm thickSiO₂ film 246 is formed on the entire surface of the device as aninsulating film interlayer. It would be understood that the surface ofthe SiO₂ film 246 is or uneven undulated to reflect the profile of thepolysilicon wiring film 203. In other words, a groove is formed betweenany two adjacent areas of the SiO₂ film 246 located above thecorresponding wire elements of the polysilicon wiring film 203. Theundulations on the surface of the device need to be removed to planarizethe surface of the device in the next step of the polishing operation.

Now, the SiO₂ film 246 is polished or scraped to planarize the SiO₂ film246. FIG. 33H illustrates how the device appears in cross section whenit is planarized. The polishing and planarizing operation is carried outtypically by using an apparatus as schematically illustrated in FIG. 3.

Referring to FIG. 3, a polishing slurry is fed to the center of the topsurface of the turntable 502 by way of a polishing slurry feed pipe 503.The turntable is rotated at a rate of about 100 rpm. A polishing cloth504 is fitted to the top surface of the turntable 502 and brought tocontact with a wafer 1, which is pressed downward with a load of 40 kgfapplied thereto by a holding device 501 rotating also at a rate of about100 rpm.

The polishing slurry is an aqueous suspension prepared by dispersingSiO₂ particles having a diameter of 80 nm in water. The suspensioncontains SiO₂ particles by 20 wt % and its hydrogen ion concentration isconstantly maintained to pHl2.0 by appropriately adding sodium hydroxidewhenever necessary.

In an experiment conducted on a sample wafer with the above identifiedparameters, it was proved that the surface of the SiO₂ film 246 and thatof the carbon film 244 had been almost completely planarized asillustrated in FIG. 33H after a prescribed polishing operation. It wasalso proved, as illustrated in FIG. 33H, that the polysilicon wiringlayer 203 underlying the carbon layer 244 had not been polished off atany spots on the 6-inch wafer and was completely covered by the carbonfilm 244. The carbon film 244 was found at least partly remaining on thewiring layer 203 when the polishing operation was over.

Thereafter, the carbon film 244 was removed in a barrel type O₂ plasmaasher to show a cross section as shown in FIG. 33I. Subsequently, a 1 μmthick planar SiO₂ film 247 was formed as an insulating film interlayeras shown in FIG. 33J. It will be appreciated from FIG. 33J that unlike aconventional insulating film interlayer illustrated in FIG. 9C, thesurface of the SiO₂ insulating film interlayer 247 is substantially flatover the entire area of the wafer, though it shows slight recesses of aheight corresponding to the thickness of the carbon film 244 removed inthe step of FIG. 33I.

The fact that the above described mode of carrying out the method of theinvention comprises a step of forming a carbon film 244 on thepolysilicon film 203 as a stopper layer prior to the start of polishingoperation makes it possible to provide large polishing rates for thepolysilicon film 203 and the SiO₂ film 246 which are the targets to bepolished, on one hand, and the carbon film 244 functioning as a stopperlayer, on the other hand, so that the operation of polishing these filmsmay be terminated when the carbon film 244 is still partly remaining inposition. Thus, the SiO₂ insulating film interlayer 247 can be madesubstantially flat over the entire surface area of the wafer.

Now, a still another mode of carrying out the present invention will bedescribed by referring to FIGS. 34A through 34I which illustratedifferent steps of thinning and planarizing a silicon film of a thinfilm semiconductor device.

Referring firstly to FIG. 34A, an 800 nm thick SiO₂ film 202 is formedon an Si substrate 201.

Then, as shown in FIG. 34B, another Si substrate 251 is heated to 800°C. and bonded to the first Si substrate 201 with the SiO₂ film 202interposed therebetween.

Thereafter, as shown in FIG. 34C, openings are formed through the secondSi substrate 251 until the openings get to the surface of the SiO₂ film202.

Subsequently, as shown in FIG. 34D, a carbon film 244 is formed on theentire surface of the Si substrate 251 to a thickness of 100 nm as astopper layer in an Ar atmosphere by DC magnetron spattering, using agraphite plate as target.

Then, as shown in FIG. 34E, photo resist is applied to the surface ofthe carbon film 244 to form a 1.5 μm thick photo resist (photo-sensitiveresin) layer 245, which is then exposed to light with a mask pattern(not shown) placed thereon and thereafter subjected to a developmentoperation to remove the exposed areas of the carbon film 244 and producea photo resist pattern 245 defined by the opening formed through the Sisubstrate 251.

A patterning operation is then carried out on the carbon film 244 bymeans of RIE using O₂ gas and also using the photo resist pattern 245 asa mask as illustrated in FIG. 34F. Then, as shown in FIG. 34G, the photoresist pattern 245 is removed by a down flow type asher in whichmicrowaves are discharged in the gaseous mixture of CF₄ and O₂.

Subsequently, the Si substrate 251 is polished or scraped to planarizethe substrate. FIG. 35H illustrates how the device appears in crosssection when it is planarized. The polishing and planarizing operationis carried out typically by using an apparatus as schematicallyillustrated in FIG. 3. The polishing slurry is an aqueous suspensionprepared by dispersing SiO₂ particles having a diameter of 80 nm inwater. The suspension contains SiO₂ particles by 20 wt % and itshydrogen ion concentration is constantly maintained to pHl2.0 byappropriately adding sodium hydroxide whenever necessary.

In an experiment conducted on a sample device, it was proved that thesurface of the Si substrate 251 had been completely planarized asillustrated in FIG. 35H after a prescribed polishing operation. It wasalso proved that the SiO₂ film 202 underlying the carbon layer 244 hadnot been polished at any spots on the 6-inch wafer and was completelycovered by the carbon film 244. The carbon film was found at leastpartly remaining on the SiO₂ film 202 when the operation of polishingthe Si substrate 23 was over.

Thereafter, the carbon film 244 was removed in a barrel type O₂ plasmaasher to complete the silicon thinning operation and produce a thinsemiconductor device.

The fact that the above described mode of carrying out the method of theinvention comprises a step of forming a carbon film 244 on the Sisubstrate 251 and the SiO₂ film 202 as a stopper layer prior to thestart of polishing operation makes it possible to provide a largepolishing rate for the Si substrate 251 which is the target to bepolished, and the carbon film 244 functioning as a stopper layer, sothat the operation of polishing these films may be terminated when thecarbon film 244 is still partly remaining in position. Thus, the siliconthinning operation in the process of manufacturing thin filmsemiconductor devices can be carried out with an enhance level ofprecision.

Table 7 below shows the rates of polishing target films orto-be-polished layers when different polishing slurries are used.

                  TABLE 7                                                         ______________________________________                                                      SiO.sub.2 film                                                  Polishing     (heat-     SiN                                                  slurry        oxidized)  film    carbon film                                  ______________________________________                                        Aqueous suspension                                                                          1,600      500     50 or less                                   containing SiO.sub.2 -80 nm                                                   dia. 20 wt %                                                                  NaOH-0.2 wt %                                                                 Aqueous suspension                                                                            750      450     50 or less                                   containing SiO.sub.2 -80 nm                                                   dia. 20 wt %                                                                  Aqueous suspension                                                                          7,000      3,000   100 or less                                  containing CeO.sub.2 -                                                        100 nm dia. 1 wt %                                                            ______________________________________                                         Å/min                                                                

While an SiO₂ film and an Si film are respectively used as the not-to-bepolished film for the first and second modes of carrying out the methodof the invention and the polishing slurry involved is an aqueoussuspension prepared by dispersing SiO₂ particles having an averagediameter of 80 nm and maintained to pHl2.0 by adding, if required,sodium hydroxide, it should be noted that the present invention is by nomeans limited thereto and any other materials may be used for the targetfilm if the forget film has a sufficiently large selectivity in terms ofthe polishing ratio with regard to a carbon film. Additionally, thepolishing slurry to be used may be of any other type that containsparticles of other appropriate materials and shows an appropriate pHlevel other than 12.0. For instance, a CeO₂ suspension may beappropriately used for the polishing slurry.

As described above in detail, the fact that the method of polishing asemiconductor device according to the invention comprises a step offorming as a stopper layer a carbon film which is resistive againstpolishing prior to the start of polishing operation makes it possible toprovide a large selectivity in terms of the polishing rate for thetarget film to be polished and the stopper layer, so that the polishingoperation may be held under accurate control. Additionally, since acarbon film is resistive against various chemicals, it can be usedpractically regardless of the type of polishing slurry involved.

Thus, with the method of the present invention, the operation ofpolishing a semiconductor device can be carried out under strict controlwith a large selectivity in terms of the polishing rate for the targetfilm to be polished and a stopper layer by forming a carbon film as thestopper layer on at least part of the layer underlying the target film,the inside of the target, the layer on the target film of the areasadjacent to the target. Therefore, with such an arrangement, chemicalinstability and other known obstacles in manufacturing semiconductordevices will be effectively eliminated.

Now, a preferable embodiment of polishing apparatus according to theinvention will be described by referring to FIG. 35 along with a mode ofcarrying out the method of the invention suited for use with theembodiment.

FIG. 35 is a schematic illustration of the embodiment of polishingapparatus.

A polishing cloth 504 is bonded to the top surface of turntable 502 anda polishing slurry is fed to the center of the polishing cloth 504 byway of a polishing slurry feed pipe 503.

The polishing slurry is an aqueous suspension containing dispersedcerium oxide particles by 1 wt %.

Wafer 201 to be polished has a diameter of 15 mm and is held by aholding device 501. The wafer 201 carries on the surface a 1 μm thickSiO₂ film (not shown) formed by chemical vapor deposition (CVD).

The turntable 502 is driven to rotate by an electric motor 511, to whichan ampere-meter 513 is connected to measure the current flowing throughthe motor 511. The electric current measured by the ampere-meter 513 istransformed into the amount of work in an arithmetic unit 541, whichgenerates a signal that terminates the polishing operation when theaccumulated amount of work has reached a given value.

FIG. 36 is a graph showing a relationship between the change in the rateof polishing a wafer with polishing time and a relationship between theelectric current flowing through the motor with polishing time, and FIG.18 is a graph showing only a characteristic cause between the polishingrate with the polishing time.

As shown in FIG. 36, the rate of polishing a wafer generally tends toincrease with time but also shows ups and downs such that a change up to30% is observed in the polishing rate. It is seen that the electriccurrent flowing through the electric motor changes as a function of thepolishing rate.

FIG. 37 is a graph showing the relationship between the electric currentflowing through the electric motor and the rate at which the wafer ispolished.

From FIG. 37, it is clear that the electric current flowing through theelectric motor is directly proportional to the rate of polishing thewafer. Thus, the polishing rate at any moment can be determined byreading the electric current flowing through the electric motor and theamount of polishing work done by that moment can be obtained byintegrating the polishing rate with time.

FIG. 38 is a graph obtained by transforming the current flowing throughthe electric motor into the friction between the target layer to bepolished and the surface plate carrying the polishing slurry.

As FIG. 38 clearly shows, the friction between the target layer to bepolished and the surface plate carrying the polishing slurry isproportional to the rate of polishing the target layer.

FIG. 39 is A graph showing the relationship between the rate ofpolishing the target layer and the rate of rotation of the turntable 502and the holding device 501.

From FIG. 39, it is clear that the rate of polishing the target layer isproportional to the rate of rotation of the turntable 502 and theholding device 501.

As may be easily anticipated, it has been proved in an experimentconducted by the inventors of the present invention that the extent towhich the target layer is polished is proportional to the time consumedfor the polishing operation.

Then, it can be said that the amount of work that has been performedbetween the target layer and the surface plate carrying the polishingslurry is proportional to the amount to which the target layer has beenpolished, which can be obtained by integrating the rate of polishing thetarget layer with time the amount of work can be obtained bymultiplaying the value of friction of FIG. 38 by the relative rotationspeed of the turntable 502 and the holding device 501 and integratingthe product with time.

As a matter of fact, in an experiment where the amount of work to beperformed between the target layer which was a 0.60 μm thick SiO₂ filmand the turntable carrying the polishing slurry was set to 45,000 J anda total of 120 wafers were polished, the wafers were polished to anamount between 0.59 μm and 0.62 μm, showing a dispersion less than 5%.

In another experiment where SiO₂ films containing fluorine and thosecontaining boron and phosphor were polished, a result similar to theabove experiment was obtained. What was remarkable with this experimentwas that the SiO₂ films containing boron and phosphor showed a polishingrate higher than that of the above experiment by about 30%.

In the above experiments, the extent to which the SiO₂ film was polishedcould be accurately controlled by calculating the amount of work to beperformed between the target layer, or the SiO₂ film, and the surfaceplate carrying the polishing slurry which was cerium oxide andterminating the polishing operation when the amount of work that hasbeen done became equal to a pre-determined value.

While the target film was an SiO₂ film and the polishing slurry wascerium oxide in the above experiments, they may be replaced by any otherappropriate film and polishing slurry respectively.

Additionally, a polishing apparatus having a configuration other thanthe one illustrated in FIG. 35 may be used.

While a proportional relationship was observed between the workperformed by an SiO₂ film that constitutes the target layer and thesurface plate carrying a polishing slurry of cerium oxide and the rateof polishing the target layer in the above experiments, such a directlyproportional relationship is not necessarily be required to calculatethe amount of the performed work during a polishing operation so long asthe friction between the target layer and the surface plate carrying apolishing slurry holds a one-to-one correspondence to the rate ofpolishing the target layer.

As described above, if the friction between the target layer and thesurface plate carrying a polishing slurry is not proportional to therate of polishing the target layer, the rate of polishing the targetlayer can be determined by reading the friction or the electric currentflowing through the motor so long as a one-to-one correspondence isobserved between the friction between the target layer and the surfaceplate carrying a polishing slurry or the electric current flowingthrough the electric motor and the rate of polishing the target layer.

Thus, according to a polishing apparatus for planarizing and polishing atarget layer formed on a semiconductor substrate according to theinvention, the extent to which the target layer is polished can beaccurately controlled on the basis of the amount of the polishing workthat has been done determined by measuring the friction between thetarget layer and the surface table carrying the polishing slurry duringthe polishing operation, calculating the rate of polishing the targetlayer from the measured friction and integrating the polishing rate withtime.

Now, another embodiment of polishing apparatus according to theinvention will be described by referring to FIGS. 40 through 43.

FIG. 40 is a schematic perspective view of the embodiment of polishingapparatus of the invention comprising a turntable 502 provided with apolishing cloth or a polishing plane 504 on the top thereof, whichpolishes a semiconductor device 201 disposed thereon, using a polishingslurry 505. The shafts 517 and 518 for rotating the turntable 502 andthe wafer holding device 501 are equipped with distortion sensors 551and 552, or distortion gauges, respectively, for detecting thedistortions of the shafts for which the shafts are responsible. Theshafts 517 and 518 are also connected to respective drive motors 511 and512 by way of respective belts 519 and 520. The drive forces generatedby the drive motors 522 and 512 give rise to friction between thepolishing plane 504 and the wafer 201. The friction generates distortionin each of the shafts 517 and 518, which is detected and converted intoan electric signal by the related distortion sensor. As shown in thegraph of FIG. 41, the relationship between the load of the polishingoperation and the distortion of the shaft or the electric signalrepresenting the distortion is linearly expressed. In other words, theelectric signal transformed from the distortion sensor accurately showsthe condition of the polishing plane 504 and that of the surface of thewafer 201.

Thus, as shown in FIG. 42, when the undulations or uneveness on thesurface of a wafer comprising an insulating film 212 and a wiring layer210 formed on a semiconductor substrate 201 is planarized by the aboveembodiment, it accurately detects the size of the surface area of theinsulating film 212 to be polished and also shows the instant when thesurface of the insulating film 14 being polished has been almostcompletely planarized.

The above described embodiment may be so modified that only a singledistortion sensor is disposed on the side of either the turntable 502 orthe wafer holding device 501. The layer to be polished does notnecessarily need to be an insulating film and may be a wiring layer.

The above described embodiment has advantages as listed below by simplyproviding the shafts 551 and 552 for rotating the turntable 502 and thewafer holding device 501 of the embodiment with respective distortionsensors.

1) The target layer can be completely planarized with an enhanced levelof precision that any conventional polishing apparatuses can neverachieve.

2) Since the fact that the insulating film has been completelyplanarized is instantly detected by the apparatus, the polishingoperation can be terminated before the underlying wiring layer isaffected so that the reliability of the wiring layer is alwaysguaranteed.

3) From the same reason as 2) above, the wiring layer is protectedagainst breaking accidents to enhance the yield of manufacturingsemiconductor devices.

4) Provision of a hard layer under the target layer to stop thepolishing operation is not required so that the process of manufacturingsemiconductor devices by using an apparatus according to the inventioncan eliminate any additional steps to raise the productivity and lowerthe cost of manufacturing. The fact that no hard stopper layer isrequired also entails an advantage that no additional insulating layerneeds to be formed after the completion of the planarizing operation.

A still another embodiment of polishing apparatus of the invention willbe described by referring to FIGS. 44 and 45.

FIG. 44 schematically illustrates the polishing section of theembodiment of polishing apparatus. It comprises a turntable 502 which isrotated by a first drive motor (not shown). A polishing unwoven cloth504 is attached on the turntable 502 and a polishing slurry feedingnozzle (not shown) is disposed on the polishing cloth. A wafer holdingdevice 501 is disposed above the polishing cloth and a sample wafer 601on which friction is measured is held on the lower surface of theholding device 501. The lower surface of the holding device 501 facesthe top surface of the turntable 502. The lower end of rotary shaft 518is fitted to the top surface of said holding device 501 so that theholding device 501 may be rotated by a second drive motor (not shown)that transmits the rotation force to the holding device 501 by way ofthe rotation shaft 518. The rotation motion of the turntable 502 andthat of the holding device 501 are controlled by a controller 611 by wayof the first and second motors respectively. As illustrated in FIG. 45,the controller 611 performs setting polishing conditions, calculating aF/Fo (as defined hereinafter) and re-setting a polishing condition.

Firstly, an object which is polished and on which friction isprovisionally measured, typically a semiconductor sample wafer 601, isfitted to the lower surface of the holding device 501. The wafer 601comprises a silicon substrate and a silicon oxide film formed on thesurface of the silicon substrate. The silicon oxide film has not beensubjected to a patterning operation and has a sufficiently largethickness. Then, the turntable 502 is rotated by the first drive motorwhile the holding device 501 is rotated by the second drive motor at afirst rate of rotation, which is defined as the relative rate ofrotation of the polishing unwoven cloth rotating with the turntable 502relative to the wafer 601 on which friction is measured.

Thereafter, a polishing slurry 505 such as an aqueous suspension ofcerium oxide is fed onto the polishing unwoven cloth via the polishingslurry feeding nozzle. The polishing unwoven cloth can retain theaqueous suspension of cerium oxide 15 to a large extent and smoothlydischarge it. Then, as the holding device 501 by a movement controlsection (not shown), the sample wafer 601 on which friction isprovisionally measured is brought to contact with the polishing unwovencloth disposed on the turntable 502. At this stage, the wafer 601 onwhich friction is provisionally measured is subjected to a first load.Thereafter, the holding device 501 is horizontally moved along the topsurface of the turntable 502 to polish the wafer 601 on which frictionis measured for a first polishing period. In short, the wafer 601 onwhich friction is provisionally measured is polished under a first setof polishing conditions of the first load, the first polishing periodand the first rate of rotation.

As the polishing operation goes on, the electric current flowing throughthe first and second drive motors are measured by the polishingcondition setting section of the controller 611. The measurement of thecurrent is in fact carried out in the working stage, which is defined asa stage where the polishing unwoven cloth has already left the initialstage, in which the polishing unwoven cloth might become quickly chokedwith the polishing slurry to rapidly raise the friction between thepolishing unwoven cloth and the target of the polishing operation, andentered into a stabilized state, showing little changes in the frictionbetween the polishing unwoven cloth and the target.

Then, there is a given relationship between the electric current and thefriction Of between the polishing unwoven cloth and the sample wafer 601or the target of polishing and therefore the friction Of can bedetermined by carrying out a given set of arithmetic operations. Then,there is another given relationship between the friction Of and the rateat which the sample wafer 601 is polished and therefore the polishingrate can be determined by carrying out another given set of arithmeticoperations. In other words, since there is a relationship as shown inFIG. 46 between the electric current and the polishing rate, thepolishing rate can be determined from the electric current.

FIG. 46 is a graph showing, as described above, the relationship betweenthe electric current of the drive motor and the polishing rate. A wafer601 comprising a silicon oxide film formed on the surface is set inposition on the embodiment and polished in a manner as described above.Then, the electric current flowing through the first and second drivemotors and the rate of polishing the wafer for this current aredetermined. FIG. 46 denotes the characteristic curve representing therelationship between the electric current and the rate at which thewafer is polished. The graph shows that the relationship between thecurrent and the polishing rate is a one-to-one correspondence.

Subsequently, the rotation of the turntable 502 and holding device 501are stopped and the sample wafer 601 on which friction has beenprovisionally measured and which has been held by the holding device 501is replaced by a wafer 602 for producing a semiconductor device. Then, asecond set of polishing conditions including a second load, a secondpolishing period and a second rate of rotation under which the siliconoxide film of the wafer 602 is polished are established from thepolishing rate. Thereafter, the turntable 502 and the holding device 501are driven to rotate by the first and second drive motors at the secondrate of rotation to apply the second load to the wafer 602, which ispolished for the second polishing period.

After the operation of polishing the wafer 602 is completed, it isreplaced by another wafer 601 for producing a semiconductor device,which is polished under the same second set of polishing conditions.When the polishing unwoven cloth has been used for a given period oftime to polish a plurality of identical wafers 602 for producingsemiconductor devices under the second set of polishing conditions,turntable 502 and the holding device 501 are stopped to rotate. At thisstage, the last wafer 602 polished by the embodiment is replaced back tothe wafer 601 on which friction is provisionally measured. Then, theturntable 502 and the holding device 501 are rotated respectively by thefirst and second drive motors at the first rate of rotation and thefirst load is applied to the wafer 601 on which friction is measured,which is then polished for the first polishing period.

While the wafer 601 on which friction is measured is being polished, theelectric current flowing through the first and second drive motors ismeasured by the F/Fo calculating arithmetic flow of FIG. 45, which thencalculates the friction F between the wafer 601 on which friction ismeasured and the polishing unwoven cloth and determines the value ofF/Fo.

When the value of F/Fo is greater than 0.9 and smaller than 1.1, thepolishing condition re-setting or reestablishing section of thecontroller 611 as shown in FIG. 45 calculates a third set of polishingconditions including a third load, a third polishing period and a thirdrate of rotation from the value of F/Fo in order to regain the polishingrate under the second set of polishing conditions so that wafers may bepolished to a same extent regardless of the changes in the polishingconditions. Then, the turntable 502 and holding device 501 stop torotate and the wafer 601 on which friction was provisionally measured isreplaced by a wafer 602 for producing a semiconductor device. Now, thepolishing apparatus is operated under the third set of polishingconditions. That is, the turntable 502 and the holding device 501 arerotated respectively by the first and second drive motors at the thirdrate of rotation and the third load is applied to the wafer 602 forproducing a semiconductor device, which is polished for the thirdpolishing period.

When the value of F/Fo is smaller than 0.9 or greater than 1.1, thedegraded polishing cloth is redressed by seasoning, cleansing and/orother appropriate measures, in which the polishing unwoven cloth may bebrushed to remove the polishing slurry 505 remaining thereat to chokethe polishing cloth. The polishing unwoven cloth can be restored to agood condition by redressing. Thereafter, the wafer 601 on whichfriction is measured is polished under the first set of polishingconditions and the F/Fo calculating arithmetic unit in FIG. 45calculates the value of F/Fo once again.

If F/Fo is found to be either smaller than 0.9 or greater than 1.1, thenthe polishing unwoven cloth is subjected to another redressingoperation. If, on the other hand, F/Fo is between 0.9 and 1.1, a thirdset of polishing conditions are reestablished from the value of F/Foabove in the polishing condition reestablishing section of FIG. 45 inorder to regain the polishing rate under the second set of polishingconditions so that the extent to which the wafer 601 is polished is keptconstant. Then, the turntable 502 and the holding device 501 stop torotate and the wafer 601 on which friction was measured is replaced by awafer 602 for producing a semiconductor device, which is then polishedunder the third set of polishing conditions.

After the operation of polishing the wafer 602 is completed, it isreplaced by another wafer 601 for producing a semiconductor device,which is polished under the same second set of polishing conditions.When the polishing unwoven cloth has been used for a given period oftime to polish a plurality of identical wafers 602 for producingsemiconductor devices under the second set of polishing conditions, theturntable 502 and the holding device 501 stop to rotate. At this stage,the last wafer 602 polished by the embodiment is replaced back to thewafer 601 on which friction is provisionally measured. Then, the wafer601 on which friction is measured is polished under the first set ofpolishing conditions.

While the wafer 601 on which friction is measured is being polished, theelectric current flowing through the first and second drive motors ismeasured by the F/Fo calculating arithmetic unit of FIG. 45, which thendetermines if the polishing unwoven cloth has been degraded and requiresa redressing operation or the polishing operation can be carried onunder a new set of polishing conditions.

Thereafter, the above described procedures are repeated. If F/Fo isfound to be less than 0.9 or greater than 1.1 after the degradedpolishing unwoven cloth has been redressed, it is determined that thepolishing unwoven cloth has gone out of its service life and thereforeshould be replaced.

FIG. 47 is a graph showing the relationship between the accumulatedservice time of the polishing unwoven cloth and the polishing rate andthe extent to which the wafer is polished obtained by monitoring thefriction between the wafer 601 on which friction is measured and thepolishing unwoven cloth as a function of the electric current flowingthrough the first and second drive motors. In other words, the currentflowing through the drive motors is measured against the accumulatedservice time of the polishing unwoven cloth, the friction between thewafer 601 on which friction is measured and the polishing unwoven clothis determined from the measured current and the rate of polishing thewafer 601 is calculated from the friction. In the graph of FIG. 47, thesolid line curve represents the relationship between the accumulatedservice time of the polishing unwoven cloth and the polishing rate,whereas the broken line curve represents the relationship between theaccumulated service time of the polishing unwoven cloth and the extentto which the wafer is polished. The first 50 minutes of the accumulatedservice time is defined as the initial stage in the use of the polishingunwoven cloth, whereas all the remaining period after the first 50minutes is defined as the working stage of the polishing unwoven cloth.

FIG. 48 is a graph showing the relationship between the accumulatedservice time of a polishing unwoven cloth used with a conventionalpolishing method and the electric current flowing through the drivemotors and the polishing rate of the polishing unwoven cloth. In FIG.48, the broken line curve represents the relationship between theaccumulated service time of the polishing unwoven cloth and the currentflowing through the drive motors, whereas the solid line curve denotesthe relationship between the accumulated service time and the polishingrate.

From FIGS. 47 and 48 it will be appreciated that the polishing ratecannot be maintained to be constant with the conventional polishingmethod even when the polishing unwoven cloth is in the working stage,whereas, with the method of the present invention, it can be held to beconstant once the polishing unwoven cloth enters the working stage andconsequently the extent to which each wafer is polished can also bemaintained to be constant.

The F/Fo calculating arithmetic unit of the control section 611 of theabove embodiment periodically detects the current flowing through thefirst and second electric motor, carries out a set of predeterminedarithmetic operations to calculate the friction between the wafer 601 onwhich friction is measured and the polishing unwoven cloth from thedetected electric current and determines the value of Fo in F/Fo. Thus,the condition of the surface of the polishing unwoven cloth can beappreciated from the obtained value of F/Fo. When the surface conditionof the polishing unwoven cloth is not favorable for polishing operationor the value of F/Fo is found to be less than 0.9 or greater than 1.1,the degraded polishing unwoven cloth is redressed by removing thepolishing slurry 505 unnecessarily choking the polishing unwoven clothby means of seasoning, cleansing and/or other appropriate measures.Then, after a while, the value of F/Fo is determined again to see theeffect of redressing and a set of new operating conditions will beestablished to meet the new surface condition. If, on the other hand,the surface condition of the polishing unwoven cloth is favorable or thevalue of F/Fo is found to be between 0.9 and 1.1, a set of new operatingconditions will be established directly from that value of F/Fo.Finally, if the surface condition of the polishing unwoven cloth is notimproved by the redressing operation, the cloth needs to be replacedbecause it is so judged that its service life is over. Thus, it isalways possible to exactly know the timing for redressing or replacingthe polishing unwoven cloth and keep the rate of polishing the targetobject from the value of F/Fo. In other words, with the method of thepresent invention, the extent to which each semiconductor device ispolished by a polishing apparatus according to the invention can alwaysbe maintained to be constant.

It should be appreciated that the polishing method of the presentinvention is particularly advantageous when the operation of polishing asemiconductor device needs to be terminated before the layer underlyingthe one being polished of the device is exposed.

It should be noted that the present invention is not limited to theabove described modes of carrying out the method of the invention andembodiments. Additionally, polishing slurries and the target layersother than the above described types may be used with an apparatus andthe method according to the invention by knowing the relationshipbetween the electric current flowing through the drive motors and thepolishing rate. For instance, the polishing slurry may be colloidalsilica and the target layer may be a polysilicon film.

The friction between the target and the polishing unwoven cloth may bedetermined by means other than the current flowing through the drivemotors.

While a polishing unwoven cloth is used to polish the target and held onthe turntable 502 in the above embodiment, it may be replaced by anyother appropriate material if it can effectively hold the polishingslurry.

While the electric current flowing through the first and second drivemotors is periodically detected as a wafer 601 on which friction ismeasured is being polished determine the timing for redressing orreplacing the degraded polishing unwoven cloth in the above embodiment,the use of such a wafer 601 is not necessarily required for the purposeof the present invention and the timing for redressing or replacing thedegraded polishing unwoven cloth can be determined by constantlymonitoring the current flowing through the first and second drive motorswhen wafers 602 for producing semiconductor devices are beingsequentially polished.

Thus, the above described embodiment that detects a first level of thefriction between the polishing plane and the target for polishing andthen a second level of the friction after a predetermined period of timeto determine the ratio of the first to second friction levels canaccurately control the extent to which each target object is polished.

Finally, still another embodiment of the invention will be described byreferring to FIGS. 49 through 51.

FIG. 49 shows a schematic illustration of the embodiment of polishingapparatus. A polishing cloth 504 having a polishing plane is disposed ona turntable 502 and a holding device 501 for holding a target 201 ofpolishing positioned opposite to the polishing plane is disposed abovethe polishing cloth 504. A liquid feed nozzle 503 is arranged in thevicinity of the holding device 501 and a polishing slurry 505 is fedthrough the liquid feed nozzle 503.

In a polishing apparatus having a configuration as described above, atarget 201 of polishing, typically a semiconductor wafer carrying asilicon oxide film on the surface is held to the lower surface of theholding device 501 in such a manner that the surface to be polished isdisposed opposite to the upper surface of the polishing cloth 504. Then,a polishing slurry 505, e.g. an aqueous suspension of cerium oxide isfed onto the polishing cloth 504 through the liquid feed nozzle 503.Subsequently, polishing plane is pressed against the wafer andfrictionally moved on the wafer to polish and wafer.

FIG. 50 schematically illustrates how the polishing plane of theembodiment is redressed when it is degraded after a long use. When thepolishing cloth 504 is used for polishing wafers for a predeterminedperiod of time, a surface active agent 701, e.g. a polycarboxylic acidtype negative ion surface active agent, fed onto the polishing cloth 504by way of the liquid feed nozzle 503 and the polishing slurry 505remaining on the polishing plane to choke the polishing plane is removedby rubbing the surface of the polishing cloth with a brush 702.Thereafter, pure water 704 is fed onto the polishing cloth 504 throughthe liquid feed nozzle 503 to wash away the surface active agent 701.

The above procedures are repeated thereafter whenever necessary.

FIG. 51 is a graph showing the change with time in the polishing rate ofthe embodiment. As the degraded polishing plane is redressed by asurface active agent 701 fed onto the polishing cloth 504 in addition toa conventional method of using a brush, a remarkable effect of removingthe remaining polishing slurry 505 is achieved. Thus, the surfacecondition of the polishing plane can be held under a good condition fora prolonged period of time by removing the polishing slurry 505remaining on the polishing cloth 504 to choke the the polishing cloth toan enhanced degree that cannot be achieved by any conventional method ofcleansing a polishing cloth.

It should be noted that the method of redressing a degraded polishingcloth used for the above embodiment is subject to various modificationsand/or alterations so long as it comprises means for using a surfaceactive agent 701. In other words, the method does not limit nor restrictthe use of any other means other than a surface active agent 701,leaving the use of pure water 704 for removing the surface active agent701 as a matter of choice. The timing for redressing a degradedpolishing plane is also not specifically defined. So, the degradedpolishing plane may be redressed while a target of polishing is beingpolished on the apparatus.

The surface active agent 701 to be used for the purpose of the presentinvention is also not limited to polycarboxylic acid type negative ionsurface active agents and the components of the surface active agent 701including hydrophilic groups, oleophilic groups and counter ions may beselectively replaced whenever appropriate. The polishing slurry 505 andthe target object 201 are also not specifically defined.

As described above, with the polishing method and a polishing apparatusaccording to the invention, the polishing slurry choking the polishingplane of the apparatus can be removed effectively and efficientlywithout posing any difficulties. Consequently, the polishing plane canbe maintained under a good condition and prevented from degradation dueto a choked condition caused by the polishing slurry and reduce thepossibility of producing scars on the surface of the target ofpolishing. Thus, the quality of target objects treated by the apparatuscan be strictly controlled and, at the same time, a prolonged servicelife can be assured for the polishing pad. Additionally, the timing forreplacing a degraded polishing pad can be detected without relying onthe effort of a skilled operator to constantly observe the surfacecondition of the polishing cloth.

What is claimed is:
 1. An apparatus for chemically and mechanicallyplanarizing a target object by a polishing plane, comprising:holdingmeans for holding the target object; polishing means having thepolishing plane for polishing being rotated relative to the targetobject held by rotation means; driving means for driving the polishingmeans to rotate the polishing plane of the polishing means to causefriction between the target object held by the holding means and thepolishing plane of the polishing means; and load detecting means fordetecting a load resulting from friction between the target object andthe polishing plane, with the load substantially corresponding to thefriction between the target object and the polishing plane, said loaddetecting means comprising distortion detecting means for detectingdistortion of a rotating shaft of the polishing means, with saiddistortion resulting from the friction.
 2. The planarizing apparatusaccording to claim 1, wherein said distortion detection means comprisesa distortion sensor for detecting said distortion and transforming thedetected distortion to an electric signal.
 3. A polishing apparatuscomprising:a table provided with a polishing plane disposed thereon; aholder means disposed opposite to the table for holding a target objecthaving a surface to be polished so as to keep said surface of the targetobject to face the polishing plane; first means for detecting a firstlevel of friction generated between said polishing plane and saidsurface of the target object when the holding means and said table areheld under pressure and said polishing plane and said surface of thetarget object are slidingly moved relative to each other to polish saidtarget object and a second level of friction between said polishingplane and said surface after a period of time; an arithmetic unit forcalculating the ratio of said first to second friction levels; andsecond means for determining the timing for carrying out an operation ofredressing the degraded polishing plane from said ratio.
 4. A polishingapparatus comprising:a table provided with a polishing plane disposedthereon; a holder means disposed opposite to the table for holding atarget object having a surface to be polished so as to keep said surfaceof the target object to face the polishing plane; first means fordetecting a first level of friction generated between said polishingplane and said surface of the target object when the holding means andsaid table are held under pressure and said polishing plane and saidsurface of the target object are slidingly moved relative to each otherto polish said target object and a second level of friction between saidpolishing plane and said surface after a period of time; an arithmeticunit for calculating the ratio of said first to second friction levels;and second means for determining the timing for replacing said polishingplane with a new one from said ratio.
 5. A polishing apparatuscomprising:a table provided with a polishing plane disposed thereon; aholder means disposed opposite to the table for holding a target objecthaving a surface to be polished so as to keep said surface of the targetobject to face the polishing plane; first means for detecting a firstlevel of friction generated between said polishing plane and saidsurface of the target object when the holding section and said table areheld under pressure and said polishing plane and said surface of thetarget object are slidingly moved relative to each other to polish saidtarget object and a second level of friction between said polishingplane and said surface after a period of time; an arithmetic unit forcalculating the ratio of said first to second friction levels; secondmeans for determining the timing for carrying out an operation ofredressing the degraded polishing plane from said ratio; and third meansfor determining the timing for replacing said polishing plane with a newone from said ratio.
 6. A polishing apparatus comprising a surface plateprovided with a polishing plane disposed thereon;holder means forholding a target object having a surface to be polished so as to keepsaid surface of the target object to face the polishing plane; drivingmeans for driving the surface plate to slidingly move the polishingplane and the surface to be polished of the target object held by theholding means relative to each other to polish the surface of the targetobject; slurry supplying means for supplying a polishing slurry onto thepolishing plane, while the surface of the target object is polished; andsurface active agent supplying means for supplying, only after thepolishing of the surface of the target object is ended, a surface activeagent to the polishing plane to redress the polishing plane; and meansfor operating said surface active agent supplying means only after thepolishing of the surface of the target object is ended.
 7. A polishingapparatus for a semiconductor device comprising the steps of:means fordetecting the friction between (a target layer) and a surface platecarrying a polishing slurry thereon during the polishing operation;means for calculating the rate of polishing the target layer from thefriction; means for determining the extent to which the target layer hasbeen polished by integrating the polishing rate with time; and means forterminating the polishing operation when the extent to which the targetlayer has been polished reaches a given value as well as means fordetecting said friction to determine the extent to which the targetlayer has been polished.
 8. A polishing apparatus for a semiconductordevice comprising the steps of:means for calculating the accumulatedamount of the work performed between (a target layer) and a surfaceplate carrying a polishing slurry thereon during the polishingoperation; and means for terminating the polishing operation when theaccumulated amount of work reaches a given value as well as means fordetecting the amount of the work performed per unit time andaccumulating the work amount with time.
 9. A polishing apparatus for asemiconductor device according to claim 7, wherein said friction isdetermined by detecting the amount of work performed by a drive motorfor driving said surface plate.
 10. A polishing apparatus for asemiconductor device according to claim 8, wherein said the amount ofthe work performed per unit time is determined by detecting the amountof work performed by a drive motor for driving said surface plate.
 11. Apolishing apparatus for a semiconductor device according to claim 10,wherein said drive motor is an electric motor and the amount of the workperformed by the drive motor is determined by detecting the electriccurrent flowing through the electric motor.
 12. A polishing apparatusaccording to claim 6, further comprising an activating means foractivating the surface active agent fed to the polishing plane to removethe polishing slurry remaining on the polishing plane therefrom.
 13. Apolishing apparatus according to claim 12, wherein the activating meanscomprises brushing means.
 14. A polishing apparatus according to claim12, further comprising water supplying means for supplying water, afterthe polishing slurry remaining on the polishing plane is removedtherefrom, onto the polishing plane to wash away the removed polishingslurry.
 15. An apparatus for chemically and mechanically planarizing atarget object by a polishing plane, comprising:holding means for holdingthe target object; polishing means having the polishing plane forpolishing being rotated relative to the target object held by rotationmeans; driving means for driving the polishing means to rotate thepolishing plane of the polishing means to cause friction between thetarget object held by the holding means and the polishing plane of thepolishing means; and load detecting means for detecting a load resultingfrom friction between the target object and the polishing plane, withthe load substantially corresponding to the friction between the targetobject and the polishing plane, said load detecting means comprising adrive current detecting means for detecting a drive current flowingthrough said driving means for driving the polishing means, the loaddetecting means comprising a distortion detecting means for detectingdistortion of a rotation mechanism of said driving means, with saiddistortion resulting from the friction.
 16. The planarizing apparatusaccording to claim 15, wherein said distortion detecting means detectsthe distortion of a rotation shaft of the rotation mechanism, and saiddistortion detecting means detects the distortion of the rotation shaftof the rotation mechanism.
 17. The planarizing apparatus according toclaim 16, wherein said distortion detecting means comprises a distortionsensor provided on the rotation shaft of the rotation mechanism.